SCHEMBL3171202

SCHEMBL3171202

C=CC(=O)OC(CCC)c1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
THRB P10828 4/20 0.40
THRA P10827 1/20 0.40
HCAR2 Q8TDS4 1/20 0.40
CYP2C19 P33261 1/20 0.39
AOC3 Q16853 1/20 0.37
PPARG P37231 2/20 0.37
PPARA Q07869 2/20 0.37
POLB P06746 2/20 0.36
GPR88 Q9GZN0 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4595927 0.91 THRB (0.44) THRBTHRAPPARGPPARAPOLB
SCHEMBL651280 0.90 THRB (0.46) THRBTHRAPPARGPPARAPOLB
SCHEMBL30505603 0.89 CYP2C19 (0.38) THRBTHRAHCAR2CYP2C19GPR88
SCHEMBL4970630 0.88 THRB (0.48) THRBTHRAPOLB
SCHEMBL9402077 0.88 THRB (0.48) THRBTHRAPOLB
SCHEMBL8086548 0.88 THRB (0.48) THRBTHRAPOLB
SCHEMBL342568 0.88 THRB (0.48) THRBTHRAPOLB
SCHEMBL1371364 0.87 THRB (0.41) THRBTHRAHCAR2CYP2C19POLB
SCHEMBL23277155 0.86 ESR1 (0.41) THRBCYP2C19
SCHEMBL17844649 0.86 THRB (0.41) THRBTHRAHCAR2CYP2C19POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116693745-A Resin, preparation method of resin and application of resin 华为技术有限公司 2023-09-05 CN claimed
CN-113493222-A Inorganic oxide nanoparticle dispersion liquid having high transparency, optical film prepared therefrom and member for display 凯斯科技股份有限公司 2021-10-12 CN claimed
EP-4267708-B1 THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS INFINEUM INT LTD (GB) 2025-07-02 EP disclosed
CN-116848094-B Tertiary amine lipid compounds and uses thereof 华南理工大学 2025-04-25 CN disclosed
US-12281203-B2 Thermally responsive brush polymers having a copolymer backbone and copolymer arms INFINEUM INTERNATIONAL LIMITED (GB) 2025-04-22 US disclosed
CN-118732351-A Electrochromic device and application thereof 华为技术有限公司 2024-10-01 CN disclosed
US-20240309155-A1 Thermally Responsive Brush Polymers Having a Copolymer Backbone and Copolymer Arms INFINEUM INTERNATIONAL LIMITED (GB) 2024-09-19 US disclosed
CN-118580418-A Electrochromic polymer, preparation method thereof, electrochromic device and electronic equipment 华为技术有限公司 2024-09-03 CN disclosed
CN-118546289-A Electrochromic polymer, electrochromic device, electronic equipment and preparation method 华为技术有限公司 2024-08-27 CN disclosed
EP-4267708-A1 THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS Infineum International Limited (GB) 2023-11-01 EP disclosed
CN-116981758-A Thermally responsive brush polymers having a copolymer backbone and copolymer arms 英菲诺姆国际有限公司 2023-10-31 CN disclosed
WO-2002004586-A1 A PARTICLE PERFUME DELIVERY SYSTEM THE PROCTER & GAMBLE COMPANY (US) 2002-01-17 WO disclosed
WO-2000068275-A1 NON-SYMMETRICAL FREE RADICAL INITIATORS AND PROCESS FOR USE THEREWITH THE PROCTER & GAMBLE COMPANY (US) 2000-11-16 WO disclosed
US-6132931-A A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US disclosed
US-6110640-A Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-08-29 US disclosed
EP-1002244-A1 METHOD OF PREPARING FOLDABLE HIGH REFRACTIVE INDEX ACRYLIC OPHTHALMIC DEVICE MATERIALS ALCON LABORATORIES, INC. (US) 2000-05-24 EP disclosed
EP-0949539-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-13 EP disclosed
WO-1999008136-A1 METHOD OF PREPARING FOLDABLE HIGH REFRACTIVE INDEX ACRYLIC OPHTHALMIC DEVICE MATERIALS ALCON LABORATORIES, INC. (US) 1999-02-18 WO disclosed
EP-0843218-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1998-05-20 EP disclosed
US-5399620-A Blends, molding materials, group transfer polymerization BASF AKTIENGESELLSCHAFT (DE) 1995-03-21 US disclosed