SCHEMBL3173583

SCHEMBL3173583

CC(=O)OC(C)N1C(=O)C=CC1=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.41
BLM P54132 2/20 0.33
ALDH1A1 P00352 2/20 0.33
CYP1A2 P05177 1/20 0.33
HPGD P15428 1/20 0.33
CYP2C19 P33261 1/20 0.33
WRN Q14191 1/20 0.33
HIF1A Q16665 1/20 0.33
GSK3A P49840 2/20 0.32
GSK3B P49841 2/20 0.32
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
CHRM1 P11229 1/20 0.32
TBXA2R P21731 1/20 0.32
MGLL Q99685 2/20 0.32
PTGS1 P23219 1/20 0.32
PTGS2 P35354 1/20 0.32
GALR3 O60755 1/20 0.31
MAPT P10636 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7142064 0.82 LMNA (0.34) TSHRBLMALDH1A1CYP1A2HPGD
SCHEMBL10796914 0.78 TSHR (0.34) TSHRBLMALDH1A1CYP1A2HPGD
SCHEMBL10793041 0.78 TSHR (0.34) TSHRBLMALDH1A1CYP1A2HPGD
SCHEMBL28034445 0.77 TSHR (0.36) TSHRBLMALDH1A1CYP1A2HPGD
SCHEMBL17916043 0.73 LMNA (0.51) ALDH1A1MAPTSMN1; SMN2
SCHEMBL2835666 0.73 MGLL (0.38) BLMALDH1A1GSK3AGSK3BMGLL
SCHEMBL3790252 0.72 MGLL (0.33) BLMALDH1A1CYP1A2HPGDCYP2C19
SCHEMBL11939115 0.71 MGLL (0.36) BLMALDH1A1GSK3AGSK3BMGLL
SCHEMBL2611102 0.71 LMNA (0.36) BLMALDH1A1CYP1A2HPGDCYP2C19
SCHEMBL22241544 0.71 LMNA (0.36) BLMALDH1A1CYP1A2HPGDCYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1051665-B1 PHOTOPOLYMERIZATION COMPOSITIONS INCLUDING MALEIMIDES AND PROCESSES FOR USING THE SAME ALBEMARLE CORP (US) 2006-07-12 EP claimed
EP-3375799-B1 METHOD FOR PRODUCING SEMI-IPN COMPOSITE AND METHOD FOR PRODUCING MOISTURE-PERMEABLE FILM DAINIPPON INK & CHEMICALS (JP) 2025-09-03 EP disclosed
CN-116719209-A Self-initiated two-photon photoresist based on maleimide and preparation and patterning methods thereof 之江实验室 2023-09-08 CN disclosed
CN-115362215-A Aqueous resin composition and coating agent DIC株式会社 2022-11-18 CN disclosed
EP-3375794-B1 METHOD FOR PRODUCING SEMI-IPN COMPOSITE AND METHOD FOR PRODUCING SYNTHETIC LEATHER DAINIPPON INK & CHEMICALS (JP) 2022-10-26 EP disclosed
CN-109790372-B Aqueous resin composition, coating agent, and article DIC株式会社 2022-03-11 CN disclosed
CN-109790371-B Method for producing semi-IPN type complex DIC株式会社 2021-07-20 CN disclosed
EP-3521371-B1 METHOD FOR PRODUCING SEMI-IPN COMPOSITE DAINIPPON INK & CHEMICALS (JP) 2021-06-16 EP disclosed
CN-108350132-B Method for producing semi-IPN type composite and method for producing moisture permeable film DIC株式会社 2021-05-28 CN disclosed
CN-108350104-B Method for producing semi-IPN type composite and method for producing synthetic leather DIC株式会社 2021-03-23 CN disclosed
US-20180312620-A1 METHOD FOR PRODUCING SEMI-IPN COMPOSITE, AND METHOD FOR PRODUCING SYNTHETIC LEATHER DIC CORPORATION (JP) 2018-11-01 US disclosed
EP-3375799-A1 METHOD FOR PRODUCING SEMI-IPN COMPOSITE AND METHOD FOR PRODUCING MOISTURE-PERMEABLE FILM DIC Corporation (JP) 2018-09-19 EP disclosed
EP-3375794-A1 METHOD FOR PRODUCING SEMI-IPN COMPOSITE, AND METHOD FOR PRODUCING SYNTHETIC LEATHER DIC Corporation (JP) 2018-09-19 EP disclosed
US-7649027-B2 having juts via photopolymerization in supercritical carbon dioxide; calcining KANSAI PAINT CO., LTD. (JP) 2010-01-19 US disclosed
US-20090023830-A1 POLYMER AND PROCESS FOR PRODUCING POLYMER KANSAI PAINT CO., LTD. (JP) 2009-01-22 US disclosed
EP-1698647-A1 POLYMER AND PROCESS FOR PRODUCING POLYMER KANSAI PAINT CO., LTD. (JP) 2006-09-06 EP disclosed
US-7081486-B2 Method of producing polymer SHIZUOKA UNIVERSITY (JP) 2006-07-25 US disclosed
EP-1598374-A1 METHOD OF PRODUCING POLYMER Japan as represented by President of Shizuoka University (JP) 2005-11-23 EP disclosed
US-20050143481-A1 Method of producing polymer KANSAI PAINT CO., LTD. (JP) 2005-06-30 US disclosed
WO-2000020517-A2 RADIATION-CURABLE COMPOSITIONS COMPRISING MALEIMIDE COMPOUNDS AND METHOD FOR PRODUCING A SUBSTRATE WITH A CURED LAYER DSM N.V. (NL) 2000-04-13 WO disclosed