Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5009659 | 0.85 | TSHR (0.38) | ALDH1A1TSHRTHRB | |
| SCHEMBL524941 | 0.81 | TSHR (0.36) | ALDH1A1TSHR | |
| SCHEMBL164400 | 0.81 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRB | |
| SCHEMBL19409885 | 0.79 | ALDH1A1 (0.36) | ALDH1A1TSHRTHRB | |
| SCHEMBL555328 | 0.79 | ALDH1A1 (0.36) | ALDH1A1TSHRTHRB | |
| SCHEMBL15477550 | 0.76 | ALDH1A1 (0.36) | ALDH1A1TSHRTHRB | |
| SCHEMBL8668722 | 0.76 | TSHR (0.42) | ALDH1A1TSHRTHRB | |
| SCHEMBL8651323 | 0.76 | ALDH1A1 (0.43) | ALDH1A1TSHRTHRB | |
| SCHEMBL15477761 | 0.75 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRB | |
| SCHEMBL3750794 | 0.75 | TSHR (0.39) | ALDH1A1TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8367771-B2 | Composition for producing organic insulator comprising an organic-inorganic metal hybrid material | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-02-05 | — | — | US | claimed |
| US-20090230388-A1 | Composition for producing organic insulator comprising an organic-inorganic metal hybrid material | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-09-17 | — | — | US | claimed |
| US-20060041096-A1 | Organic-inorganic metal hybrid material and composition for producing organic insulator comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-02-23 | — | — | US | claimed |
| US-10202535-B2 | Method for treating subterranean formations | LAMBERTI SPA (IT) | 2019-02-12 | — | — | US | disclosed |
| US-20170247597-A1 | METHOD FOR TREATING SUBTERRANEAN FORMATIONS | LAMBERTI SPA (IT) | 2017-08-31 | — | — | US | disclosed |
| WO-2016030165-A1 | METHOD FOR TREATING SUBTERRANEAN FORMATIONS | LAMBERTI SPA (IT) | 2016-03-03 | — | — | WO | disclosed |
| US-8367771-B2 | Composition for producing organic insulator comprising an organic-inorganic metal hybrid material | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-02-05 | — | — | US | disclosed |
| US-7834120-B2 | Monofunctional monomer having cage oligosiloxane structure and method of making | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-16 | — | — | US | disclosed |
| US-7645556-B2 | Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-01-12 | — | — | US | disclosed |
| US-20090230388-A1 | Composition for producing organic insulator comprising an organic-inorganic metal hybrid material | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-09-17 | — | — | US | disclosed |
| EP-1428795-B1 | SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF | CHISSO CORP (JP) | 2009-07-22 | — | — | EP | disclosed |
| US-20060006380-A1 | Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-01-12 | — | — | US | disclosed |
| US-20050279995-A1 | Composition for preparing organic insulating film and organic insulating film prepared from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-12-22 | — | — | US | disclosed |
| US-20040249103-A1 | Silsesquioxane derivatives and process for production thereof | JNC CORPORATION (JP) | 2004-12-09 | — | — | US | disclosed |
| EP-1428795-A1 | SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF | CHISSO CORPORATION (JP) | 2004-06-16 | — | — | EP | disclosed |
| US-6632585-B1 | Copolymer of partially deuterated and/or halogenated vinyl siloxanes; heat, water and chemical resistance; high transmission at communication wavelength ranges | NIPPON SHEET GLASS CO., LTD. (JP) | 2003-10-14 | — | — | US | disclosed |
| EP-1154323-A1 | PHOTOSENSITIVE COMPOSITION, AND OPTICAL WAVEGUIDE ELEMENT AND PROCESS FOR PRODUCING THE SAME | Nippon Sheet Glass Co., Ltd. (JP) | 2001-11-14 | — | — | EP | disclosed |
| US-6303730-B1 | NONHYDROLYTIC CONDENSATION OF CHLOROSILANES WITH POLYMERIZABLE GROUPS AND OPTIONALLY FLUORINATED GROUPS, WITH THE HELP OF A CONDENSATION AGENT AND THERMAL AND/OR PHOTOCHEMICAL POLYMERIZATION OF THE OBTAINED CONDENSATION PRODUCT | INSTITUT FUR NEUE MATERIALIEN GEMEINNUTZIGE GMBH (DE) | 2001-10-16 | — | — | US | disclosed |
| US-5852153-A | Trimethylsiloxy group-containing polysiloxane and a process for producing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-12-22 | — | — | US | disclosed |
| US-5693735-A | Trimethylsiloxy group-containing polysiloxane and a process for producing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-12-02 | — | — | US | disclosed |