SCHEMBL524941

SCHEMBL524941

CCCC(OC(C)=O)[SiH](Cl)Cl

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.36
TRPV1 Q8NER1 1/20 0.34
CHRM1 P11229 2/20 0.33
TDP1 Q9NUW8 2/20 0.33
AKR1A1 P14550 1/20 0.33
CHRM3 P20309 1/20 0.33
HTR2A P28223 1/20 0.33
HTR2C P28335 1/20 0.33
ADRA1A P35348 1/20 0.33
HRH1 P35367 1/20 0.33
DRD3 P35462 1/20 0.33
SLC6A3 Q01959 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC2 Q92769 1/20 0.33
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
TBXA2R P21731 1/20 0.32
CYP3A4 P08684 2/20 0.32
NFKB1 P19838 2/20 0.32
NPSR1 Q6W5P4 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL523504 0.83 TSHR (0.39) TSHRTRPV1CHRM1TDP1CHRM2
SCHEMBL3175840 0.81 ALDH1A1 (0.39) TSHRALDH1A1
SCHEMBL17138324 0.79 TSHR (0.36) TSHRTRPV1CHRM1TDP1AKR1A1
SCHEMBL963718 0.78 TSHR (0.34) TSHRTRPV1CHRM1TDP1AKR1A1
SCHEMBL3750794 0.77 TSHR (0.39) TSHRCYP3A4SMN1; SMN2ALDH1A1HSD17B10
SCHEMBL3341050 0.76 TSHR (0.33) TSHRCHRM1TDP1AKR1A1CHRM3
SCHEMBL5091235 0.74 FAAH (0.30) FAAH
SCHEMBL5694155 0.71
SCHEMBL4838071 0.70 TSHR (0.43) TSHRCHRM1TDP1AKR1A1CHRM3
SCHEMBL190306 0.70 TSHR (0.43) TSHRTRPV1CHRM1TDP1AKR1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111883748-A Method for coating oxide film on surface of lithium ion battery anode powder material 华南理工大学 2020-11-03 CN claimed
US-8039049-B2 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2011-10-18 US claimed
US-7405168-B2 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMITED (JP) 2008-07-29 US claimed
US-20080076262-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2008-03-27 US claimed
US-7345000-B2 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2008-03-18 US claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040816-A2 TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
CN-111883748-A Method for coating oxide film on surface of lithium ion battery anode powder material 华南理工大学 2020-11-03 CN disclosed
CN-104974184-B preparation of silazane Compounds 信越化学工业株式会社 2019-12-06 CN disclosed
EP-2930177-B1 PREPARATION OF SILAZANE COMPOUND SHINETSU CHEMICAL CO (JP) 2018-04-25 EP disclosed
US-9416147-B2 Preparation of silazane compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-16 US disclosed
US-20030072932-A1 Transparent substrate coated with a polymer layer SAINT-GOBAIN GLASS FRANCE (FR) 2003-04-17 US disclosed
EP-1261557-A1 TRANSPARENT SUBSTRATE COATED WITH A POLYMER LAYER SAINT-GOBAIN GLASS FRANCE (FR) 2002-12-04 EP disclosed
WO-2001066481-A1 TRANSPARENT SUBSTRATE COATED WITH A POLYMER LAYER SAINT-GOBAIN GLASS FRANCE (FR) 2001-09-13 WO disclosed
US-3948963-A CATALYSTS TH. GOLDSCHMIDT AG (DT) 1976-04-06 US disclosed