Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | HTR2C | P28335 | 2/20 | 0.37 |
| ▸ | PSEN1 | P49768 | 1/20 | 0.37 |
| ▸ | PSEN2 | P49810 | 1/20 | 0.37 |
| ▸ | APH1B | Q8WW43 | 1/20 | 0.37 |
| ▸ | NCSTN | Q92542 | 1/20 | 0.37 |
| ▸ | APH1A | Q96BI3 | 1/20 | 0.37 |
| ▸ | PSENEN | Q9NZ42 | 1/20 | 0.37 |
| ▸ | HTR2A | P28223 | 1/20 | 0.37 |
| ▸ | HTR6 | P50406 | 8/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 2/20 | 0.34 |
| ▸ | RAB9A | P51151 | 2/20 | 0.34 |
| ▸ | HTR2B | P41595 | 1/20 | 0.34 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30137808 | 1.00 | ALDH1A1 (0.38) | ALDH1A1POLBHTR2CPSEN1PSEN2 | |
| SCHEMBL3177199 | 0.99 | ALDH1A1 (0.37) | ALDH1A1POLBHTR2CPSEN1PSEN2 | |
| SCHEMBL30137810 | 0.99 | ALDH1A1 (0.37) | ALDH1A1POLBHTR2CPSEN1PSEN2 | |
| SCHEMBL30137815 | 0.84 | MEN1 (0.41) | ALDH1A1HTR2CHTR2AKMT2AMEN1 | |
| SCHEMBL3174904 | 0.84 | MEN1 (0.41) | ALDH1A1HTR2CHTR2AKMT2AMEN1 | |
| SCHEMBL3181076 | 0.83 | CNR1 (0.45) | POLBTSHRGAASMN1; SMN2 | |
| SCHEMBL30137806 | 0.83 | CNR1 (0.45) | POLBTSHRGAASMN1; SMN2 | |
| SCHEMBL3176289 | 0.83 | KMT2A (0.36) | ALDH1A1KMT2AMEN1PKMGAA | |
| SCHEMBL30137798 | 0.83 | MEN1 (0.40) | ALDH1A1HTR2CHTR2AKMT2AMEN1 | |
| SCHEMBL3174918 | 0.83 | MEN1 (0.40) | ALDH1A1HTR2CHTR2AKMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118011733-A | Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-113348188-B | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117075428-A | Negative photosensitive resin composition | DIC株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-110959138-B | Resist material | DIC株式会社 | 2023-06-30 | — | — | CN | disclosed |
| CN-115480447-A | Negative photosensitive resin composition | DIC株式会社 | 2022-12-16 | — | — | CN | disclosed |
| US-11487204-B2 | Resist material | DIC CORPORATION (JP) | 2022-11-01 | — | — | US | disclosed |
| CN-113348188-A | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2021-09-03 | — | — | CN | disclosed |
| CN-108368214-B | Novolac resin and resist film | DIC株式会社 | 2021-03-23 | — | — | CN | disclosed |
| CN-108368213-B | Novolac resin and resist film | DIC株式会社 | 2020-12-18 | — | — | CN | disclosed |
| CN-107003612-B | Photosensitive composition for forming resist underlayer film, and resist underlayer film | DIC株式会社 | 2020-11-06 | — | — | CN | disclosed |
| US-7115690-B2 | Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. (JP) | 2006-10-03 | — | — | US | disclosed |
| US-20060204893-A1 | Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. | 2006-09-14 | — | — | US | disclosed |
| US-20050287471-A1 | Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same | DAIKIN INDUSTRIES, LTD. | 2005-12-29 | — | — | US | disclosed |
| US-6908724-B2 | Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same | DAIKIN INDUSTRIES, LTD. (JP) | 2005-06-21 | — | — | US | disclosed |
| US-20040214103-A1 | Process for preparing fluorine-containing norbornene derivative | DAIKIN INDUSTRIES, LTD. | 2004-10-28 | — | — | US | disclosed |
| US-20040191680-A1 | Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. | 2004-09-30 | — | — | US | disclosed |
| EP-1449860-A1 | NOVEL FLUOROPOLYMER, RESIST COMPOSITIONS CONTAINING THE SAME, AND NOVEL FLUOROMONOMERS | Daikin Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | disclosed |
| EP-1415974-A1 | PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES | Daikin Industries, Ltd. (JP) | 2004-05-06 | — | — | EP | disclosed |
| US-20030152864-A1 | Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same | DAIKIN INDUSTRIES, LTD. | 2003-08-14 | — | — | US | disclosed |
| EP-1275666-A1 | NOVEL FLUOROPOLYMER HAVING ACID-REACTIVE GROUP AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION CONTAINING THE SAME | Daikin Industries, Ltd. (JP) | 2003-01-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11487204-B2 | Resist material | FLNA, AFF1, RXRA | ALDH1A1 2479/4885POLB 3939/4885HTR2C 2213/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.