SCHEMBL3177352

SCHEMBL3177352

C=C(C)C(=O)OC(C)c1cc(N(C)C)ccc1C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.39
KDM4E B2RXH2 2/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
SLC16A3 O15427 1/20 0.36
ALDH1A1 P00352 4/20 0.34
MYC P01106 1/20 0.32
MAOA P21397 2/20 0.32
MAOB P27338 2/20 0.32
CYP1A2 P05177 2/20 0.31
CYP2C19 P33261 2/20 0.31
LRP6 O75581 2/20 0.31
DKK1 O94907 1/20 0.31
CYP2D6 P10635 1/20 0.31
HIF1A Q16665 1/20 0.31
HSD17B10 Q99714 1/20 0.31
MEN1 O00255 3/20 0.31
LMNA P02545 1/20 0.31
CYP3A4 P08684 1/20 0.31
TSHR P16473 1/20 0.31
NPC1 O15118 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9843288 0.82 CA12 (0.41) KMT2AKDM4EL3MBTL1ALDH1A1MYC
SCHEMBL5174217 0.81 L3MBTL1 (0.40) KMT2AKDM4EL3MBTL1SLC16A3ALDH1A1
SCHEMBL9633365 0.80 SLC16A3 (0.39) KMT2AKDM4EL3MBTL1SLC16A3ALDH1A1
SCHEMBL21112015 0.77 ALDH1A1 (0.41) KMT2AKDM4EALDH1A1CYP1A2HSD17B10
SCHEMBL17042882 0.77 KMT2A (0.51) KMT2AKDM4EL3MBTL1SLC16A3ALDH1A1
SCHEMBL4882921 0.73 ALDH1A1 (0.41) KMT2AKDM4EL3MBTL1ALDH1A1HSD17B10
SCHEMBL1276039 0.71 SLC37A4 (0.38) KMT2AKDM4EALDH1A1HSD17B10CYP3A4
SCHEMBL5522604 0.71 ALDH1A1 (0.35) KDM4EALDH1A1CYP1A2TSHRPOLB
SCHEMBL14135517 0.71 ALDH1A1 (0.36) ALDH1A1LMNATSHRMAPTSMN1; SMN2
SCHEMBL6285569 0.70 MAPK1 (0.39) KMT2AKDM4EL3MBTL1ALDH1A1MYC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-6122608-A None JP disclosed
US-20100112474-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, METHOD FOR FORMING A PERMANENT PATTERN, AND PRINTED BOARD FUJIFILM CORPORATION (JP) 2010-05-06 US disclosed
US-7659324-B2 Accelerators and initiators, both with polymerizable groups, can be cured without problems by radical polymerization, materials being obtained which contain an extremely small proportion of soluble components IVOCLAR VIVADENT AG (LI) 2010-02-09 US disclosed
US-20080268374-A1 Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process FUJIFILM CORPORATION (JP) 2008-10-30 US disclosed
EP-1574524-B1 Dental material with improved compatibility IVOCLAR VIVADENT AG (LI) 2008-10-08 EP disclosed
US-20080213688-A1 Photosensitive Transfer Material, Pattern Forming Process, and Patterns FUJIFILM CORPORATION (JP) 2008-09-04 US disclosed
US-20050203199-A1 Dental materials with improved compatibility IVOCLAR VIVADENT AG 2005-09-15 US disclosed
EP-1574524-A1 Dental material with improved compatibility Ivoclar Vivadent AG (LI) 2005-09-14 EP disclosed
JP-H06122608-A DENTAL ADHESIVE PRIMER AND DENTIN PRETREATING AGENT UNIV CALIFORNIA 1994-05-06 JP disclosed