SCHEMBL3189261

SCHEMBL3189261

CC(C)(C)Oc1cccc([S+](c2ccccc2)c2ccccc2)c1OC(C)(C)C

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 1/20 0.33
KDM4E B2RXH2 1/20 0.31
ALDH1A1 P00352 1/20 0.31
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3199523 0.90 CA1 (0.36) KDM4EALDH1A1HSD17B10
SCHEMBL3200916 0.90 NFE2L2 (0.33) KCNH2KDM4EALDH1A1
SCHEMBL3193986 0.83 KCNH2 (0.33) KCNH2KDM4EALDH1A1HSD17B10
SCHEMBL3195572 0.83 SCN4A (0.32) ALDH1A1
SCHEMBL3197636 0.82 ALDH1A1 (0.36) ALDH1A1
SCHEMBL3203429 0.82 KDM4E (0.33) KCNH2KDM4EALDH1A1HSD17B10
SCHEMBL3190242 0.79 HPGD (0.39) KDM4EALDH1A1HSD17B10
SCHEMBL3183450 0.79 MAPT (0.37) KDM4EALDH1A1HSD17B10
SCHEMBL3191773 0.79 KCNH2 (0.36) KCNH2KDM4EALDH1A1HSD17B10
SCHEMBL2220781 0.75 KCNH2 (0.43) KCNH2KDM4EALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed