SCHEMBL3203429

SCHEMBL3203429

CC(C)(C)Oc1cccc([S+](c2ccccc2)c2ccccc2)c1O

nearest known ligand 0.33

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.33
ALDH1A1 P00352 2/20 0.33
HSD17B10 Q99714 2/20 0.33
CA2 P00918 1/20 0.33
KCNH2 Q12809 1/20 0.32
LMNA P02545 1/20 0.32
TP53 P04637 1/20 0.32
CYP3A4 P08684 1/20 0.32
MAPT P10636 1/20 0.32
HPGD P15428 1/20 0.32
ALOX15 P16050 1/20 0.32
ALOX12 P18054 1/20 0.32
MAPK1 P28482 1/20 0.32
SMPD3 Q9NY59 1/20 0.30
GABRA1 P14867 1/20 0.30
GABRB2 P47870 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3189261 0.82 KCNH2 (0.33) KDM4EALDH1A1HSD17B10KCNH2
SCHEMBL3193986 0.82 KCNH2 (0.33) KDM4EALDH1A1HSD17B10KCNH2MAPT
SCHEMBL3189062 0.81 KDM4E (0.52) KDM4EALDH1A1HSD17B10CA2LMNA
SCHEMBL3200916 0.79 NFE2L2 (0.33) KDM4EALDH1A1CA2KCNH2MAPK1
SCHEMBL3191773 0.78 KCNH2 (0.36) KDM4EALDH1A1HSD17B10CA2KCNH2
SCHEMBL3197636 0.77 ALDH1A1 (0.36) ALDH1A1CA2
SCHEMBL3183375 0.77 TP53 (0.36) KDM4EALDH1A1HSD17B10CA2KCNH2
SCHEMBL3190355 0.77 ACLY (0.40) KDM4EALDH1A1HSD17B10LMNAMAPT
SCHEMBL5008996 0.76 ALDH1A1 (0.44) KDM4EALDH1A1HSD17B10CA2KCNH2
SCHEMBL3191770 0.76 ESR2 (0.33) ALDH1A1HSD17B10LMNACYP3A4ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed