Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TPMT | P51580 | 2/20 | 0.44 |
| ▸ | TP53 | P04637 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | MAOB | P27338 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 3/20 | 0.36 |
| ▸ | CA2 | P00918 | 3/20 | 0.36 |
| ▸ | CA12 | O43570 | 2/20 | 0.36 |
| ▸ | CA7 | P43166 | 2/20 | 0.36 |
| ▸ | CA9 | Q16790 | 2/20 | 0.36 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.36 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.36 |
| ▸ | PTPRC | P08575 | 1/20 | 0.35 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.35 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.35 |
| ▸ | PTPRA | P18433 | 1/20 | 0.35 |
| ▸ | PTPRB | P23467 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1685590 | 0.94 | TPMT (0.48) | TPMTTP53ALDH1A1ALOX15CYP1A2 | |
| SCHEMBL34467596 | 0.92 | TPMT (0.46) | TPMTTP53ALDH1A1ALOX15CYP1A2 | |
| SCHEMBL31086529 | 0.80 | KDM4E (0.43) | TPMTTP53ALDH1A1ALOX15PTGS2 | |
| SCHEMBL19866316 | 0.80 | TP53 (0.41) | TPMTTP53ALDH1A1ALOX15CYP1A2 | |
| SCHEMBL8382170 | 0.80 | LCK (0.48) | TPMTTP53ALDH1A1ALOX15MAOB | |
| SCHEMBL24597721 | 0.80 | KDM4E (0.44) | TPMTTP53ALDH1A1MAOBKMT2A | |
| SCHEMBL606644 | 0.79 | CA1 (0.48) | TPMTTP53ALDH1A1ALOX15CA1 | |
| SCHEMBL10597044 | 0.77 | KDM4E (0.45) | TPMTALDH1A1CYP1A2KMT2AKDM4E | |
| SCHEMBL6827838 | 0.77 | KEAP1 (0.45) | TPMTTP53ALDH1A1ALOX15CYP1A2 | |
| SCHEMBL23601097 | 0.77 | MAPT (0.43) | TPMTTP53ALDH1A1ALOX15CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0070198-B1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMATION METHOD USING THE SAME | Hitachi, Ltd. (JP) | 1985-06-19 | — | — | EP | claimed |
| EP-0070198-A1 | Radiation-sensitive composition and pattern-formation method using the same | Hitachi, Ltd. (JP) | 1983-01-19 | — | — | EP | claimed |
| US-20230250229-A1 | IODO-FUNCTIONALIZED POLYMERS AS MASS SPECTROMETRY CALIBRANTS WITH A MASS-DEFECT OFFSET | POLYMER FACTORY SWEDEN AB (SE) | 2023-08-10 | — | — | US | disclosed |
| US-20230250229-A1 | IODO-FUNCTIONALIZED POLYMERS AS MASS SPECTROMETRY CALIBRANTS WITH A MASS-DEFECT OFFSET | POLYMER FACTORY SWEDEN AB (SE) | 2023-08-10 | — | — | US | disclosed |
| US-11681220-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-20 | — | — | US | disclosed |
| US-11681220-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-20 | — | — | US | disclosed |
| CN-116253661-A | Amide compound containing iodinated aryl or iodinated heteroaryl, and preparation method and application thereof | 科睿驰（深圳）医疗科技发展有限公司 | 2023-06-13 | — | — | CN | disclosed |
| US-11639419-B2 | Iodo-functionalized polymers as mass spectrometry calibrants with a mass-defect offset | THE ADMINISTRATORS OF THE TULANE EDUCATIONAL FUND (US) | 2023-05-02 | — | — | US | disclosed |
| US-11639419-B2 | Iodo-functionalized polymers as mass spectrometry calibrants with a mass-defect offset | THE ADMINISTRATORS OF THE TULANE EDUCATIONAL FUND (US) | 2023-05-02 | — | — | US | disclosed |
| US-20210286260-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-09-16 | — | — | US | disclosed |
| US-20200181327-A1 | IODO-FUNCTIONALIZED POLYMERS AS MASS SPECTROMETRY CALIBRANTS WITH A MASS-DEFECT OFFSET | POLYMER FACTORY SWEDEN AB (SE) | 2020-06-11 | — | — | US | disclosed |
| US-5445961-A | Preculturing under stresses | DEKALB GENETICS CORPORATION (US) | 1995-08-29 | — | — | US | disclosed |
| US-5322789-A | Regeneration of monocotyledonous plants; preculturing with a sugar alcohol and colchicine | DEKALB PLANT GENETICS (US) | 1994-06-21 | — | — | US | disclosed |
| EP-0461178-A1 | METHOD FOR INCREASING THE ABILITY OF MAIZE TO UNDERGO ANDROGENESIS, AND PRODUCTS PRODUCED THEREFROM | UNITED AGRISEEDS, INC. (US) | 1991-12-18 | — | — | EP | disclosed |
| WO-1990009450-A2 | METHOD FOR INCREASING THE ABILITY OF MAIZE TO UNDERGO ANDROGENESIS, AND PRODUCTS PRODUCED THEREFROM | UNITED AGRISEEDS, INC. (US) | 1990-08-23 | — | — | WO | disclosed |
| EP-0070198-B1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMATION METHOD USING THE SAME | Hitachi, Ltd. (JP) | 1985-06-19 | — | — | EP | disclosed |
| US-4465768-A | Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate | HITACHI, LTD. (JP) | 1984-08-14 | — | — | US | disclosed |
| EP-0070198-A1 | Radiation-sensitive composition and pattern-formation method using the same | Hitachi, Ltd. (JP) | 1983-01-19 | — | — | EP | disclosed |
| US-4135909-A | Salts of phosphonic acids | BASF AKTIENGESELLSCHAFT (DE) | 1979-01-23 | — | — | US | disclosed |
| US-4071551-A | Salts of phosphonic acids | VASE AKTIENGESELLSCHAFT (DT) | 1978-01-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11681220-B2 | Resist composition and method for producing resist pattern | RER1, POLR1A, REV1 | TPMT 4046/4885TP53 3887/4885ALDH1A1 879/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.