SCHEMBL3190673

SCHEMBL3190673

O=S(=O)(O)c1cccc(F)c1C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC22A12 Q96S37 3/20 0.39
TTR P02766 2/20 0.39
HSD11B1 P28845 2/20 0.37
KAT6A Q92794 4/20 0.37
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
CES2 O00748 1/20 0.34
CES1 P23141 1/20 0.34
MYC P01106 1/20 0.33
HCAR1 Q9BXC0 1/20 0.33
ABCC9 O60706 1/20 0.33
ABCC8 Q09428 1/20 0.33
KCNJ11 Q14654 1/20 0.33
KCNJ8 Q15842 1/20 0.33
PTPN1 P18031 1/20 0.33
FABP4 P15090 1/20 0.33
CCNA2 P20248 1/20 0.33
CDK2 P24941 1/20 0.33
MAPK14 Q16539 1/20 0.33
MEN1 O00255 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2047485 0.82 SLC22A12 (0.40) SLC22A12HSD11B1KAT6AESR1ESR2
SCHEMBL17698980 0.81 PTGES2 (0.45) SLC22A12CDK2
SCHEMBL27152694 0.81 SLC22A12 (0.39) SLC22A12HSD11B1KAT6AESR1ESR2
SCHEMBL3062954 0.81 MEN1 (0.43) SLC22A12TTRHSD11B1KAT6ACES1
SCHEMBL30681743 0.81 SLC22A12 (0.39) SLC22A12HSD11B1KAT6AESR1ESR2
SCHEMBL5365755 0.79 TTR (0.38) SLC22A12TTRHSD11B1MYCPTPN1
Hydrochloric Acid SCHEMBL28299620 0.79 MEN1 (0.42) SLC22A12TTRHSD11B1KAT6ACES1
SCHEMBL14991105 0.78 TTR (0.37) TTRHSD11B1MYCFABP4CCNA2
SCHEMBL28312404 0.77 HSD11B1 (0.48) SLC22A12HSD11B1ABCC9ABCC8KCNJ11
SCHEMBL229902 0.75 PTGES2 (0.46) TTRKAT6ACES2CES1MYC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed