Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGES2 | Q9H7Z7 | 2/20 | 0.46 |
| ▸ | CES2 | O00748 | 3/20 | 0.45 |
| ▸ | CES1 | P23141 | 3/20 | 0.45 |
| ▸ | BCHE | P06276 | 1/20 | 0.45 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.45 |
| ▸ | TTR | P02766 | 2/20 | 0.44 |
| ▸ | MYC | P01106 | 1/20 | 0.37 |
| ▸ | KAT6A | Q92794 | 4/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.36 |
| ▸ | PKLR | P30613 | 1/20 | 0.36 |
| ▸ | FABP4 | P15090 | 1/20 | 0.36 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.36 |
| ▸ | CDK2 | P24941 | 1/20 | 0.36 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL27565435 | 0.98 | PTGES2 (0.45) | PTGES2CES2CES1BCHEAKR1B1 | |
| SCHEMBL778163 | 0.82 | PTGES2 (0.41) | PTGES2CES2CES1BCHEAKR1B1 | |
| SCHEMBL152363 | 0.82 | PKM (0.45) | PTGES2CES2CES1BCHEAKR1B1 | |
| SCHEMBL778219 | 0.81 | AKR1B1 (0.56) | PTGES2CES2CES1BCHEAKR1B1 | |
| SCHEMBL231071 | 0.81 | KAT6A (0.46) | CES2CES1AKR1B1TTRMYC | |
| SCHEMBL30476135 | 0.81 | KAT6A (0.46) | CES2CES1AKR1B1TTRMYC | |
| SCHEMBL29860559 | 0.81 | AKR1B1 (0.56) | PTGES2CES2CES1BCHEAKR1B1 | |
| SCHEMBL28811695 | 0.80 | AURKA (0.44) | TTRMYCKAT6AFABP4CCNA2 | |
| SCHEMBL8379679 | 0.79 | KAT6A (0.44) | CES2CES1AKR1B1TTRMYC | |
| SCHEMBL8376433 | 0.79 | KAT6A (0.44) | CES2CES1AKR1B1TTRMYC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115151591-B | Composition, cured product, and method for producing cured product | 株式会社艾迪科 | 2024-03-01 | — | — | CN | disclosed |
| CN-111699204-B | Radical polymerization initiator, composition containing the same, cured product thereof, method for producing the same, and compound | 株式会社ADEKA | 2023-07-21 | — | — | CN | disclosed |
| US-11618742-B2 | Radical polymerization initiator, composition containing same, cured product of composition, production method for cured product, and compound | ADEKA CORPORATION (JP) | 2023-04-04 | — | — | US | disclosed |
| US-11591308-B2 | — | — | 2023-02-28 | — | — | US | disclosed |
| CN-115151591-A | Composition, cured product, and method for producing cured product | 株式会社艾迪科 | 2022-10-04 | — | — | CN | disclosed |
| CN-114502608-A | Polymerizable composition, carrier, cured product, and method for producing same | 株式会社ADEKA | 2022-05-13 | — | — | CN | disclosed |
| US-20210107887-A1 | RADICAL POLYMERIZATION INITIATOR, COMPOSITION CONTAINING SAME, CURED PRODUCT OF COMPOSITION, PRODUCTION METHOD FOR CURED PRODUCT, AND COMPOUND | ADEKA CORPORATION (JP) | 2021-04-15 | — | — | US | disclosed |
| EP-3753958-A1 | RADICAL POLYMERIZATION INITIATOR, COMPOSITION CONTAINING SAME, CURED PRODUCT OF COMPOSITION, PRODUCTION METHOD FOR CURED PRODUCT, AND COMPOUND | ADEKA CORPORATION (JP) | 2020-12-23 | — | — | EP | disclosed |
| CN-111699204-A | Radical polymerization initiator, composition containing the same, cured product thereof, method for producing the same, and compound | 株式会社ADEKA | 2020-09-22 | — | — | CN | disclosed |
| US-10538533-B2 | Heteroaryls and uses thereof | MILLENNIUM PHARMACEUTICALS, INC. (US) | 2020-01-21 | — | — | US | disclosed |
| US-20050158657-A1 | Radiation-sensitive resin composition | SUZUKI AKI (JP) | 2005-07-21 | — | — | US | disclosed |
| US-6899989-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-31 | — | — | US | disclosed |
| US-20030235779-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-25 | — | — | US | disclosed |
| US-20030207201-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-06 | — | — | US | disclosed |
| US-6602647-B2 | Photo acid generator with high transparency and excellent heat stability in a photoresist for lithography using far ultraviolet light, especially light of ArF excimer consists of a cyclic sulfonium compound with 2-oxo group | NEC CORPORATION (JP) | 2003-08-05 | — | — | US | disclosed |
| US-20030113659-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| US-20020045122-A1 | Sulfonium salt compound and resist composition and pattern forming method using the same | NEC CORPORATION | 2002-04-18 | — | — | US | disclosed |
| EP-1113334-A1 | Sulfonium salt compound, resist composition comprising the same and pattern forming method using the composition | NEC CORPORATION (JP) | 2001-07-04 | — | — | EP | disclosed |
| US-4278561-A | MONITORING SHELF LIFE OF PERISHABLES, POLYMERIZATION, COLOR CHANGE | ALLIED CHEMICAL CORPORATION (US) | 1981-07-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11591308-B2 | — | RER1, CBR1, H1-10 | PTGES2 394/4885CES2 777/4885CES1 1154/4885 |
| US-11618742-B2 | Radical polymerization initiator, composition containing same, cured product of composition, production method for cured product, and compound | ASH2L, RER1, BOLA2; BOLA2B | PTGES2 247/4885CES2 945/4885CES1 1272/4885 |
| US-20030207201-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | ASIC1, PARG, EEF1A2 | PTGES2 3782/4885CES2 3936/4885CES1 4664/4885 |
| US-10538533-B2 | Heteroaryls and uses thereof | VPS35, VPS4B, VPS26B | PTGES2 4512/4885CES2 3046/4885CES1 847/4885 |
| US-20210107887-A1 | RADICAL POLYMERIZATION INITIATOR, COMPOSITION CONTAINING SAME, CURED PRODUCT OF COMPOSITION, PRODUCTION METHOD FOR CURED PRODUCT, AND COMPOUND | RRP12, ASH2L, RER1 | PTGES2 83/4885CES2 380/4885CES1 1405/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.