SCHEMBL3194807

SCHEMBL3194807

COC(=O)c1c2ccccc2c(C(=O)O)c2ccccc12

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.60
KMT2A Q03164 3/20 0.60
TSHR P16473 1/20 0.54
CA12 O43570 2/20 0.52
CA1 P00915 2/20 0.52
CA2 P00918 2/20 0.52
CA7 P43166 2/20 0.52
CA9 Q16790 2/20 0.52
CA14 Q9ULX7 2/20 0.52
NR4A2 P43354 3/20 0.51
LMNA P02545 2/20 0.51
MAPK1 P28482 1/20 0.51
KDM4E B2RXH2 4/20 0.50
ALDH1A1 P00352 3/20 0.50
HPGD P15428 3/20 0.50
HSD17B10 Q99714 3/20 0.50
CYP1A2 P05177 1/20 0.50
GLA P06280 1/20 0.50
CYP2C19 P33261 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL70573 0.91 CA12 (0.60) MEN1KMT2ATSHRCA12CA1
SCHEMBL28032836 0.90 MEN1 (0.63) MEN1KMT2ATSHRCA12CA1
SCHEMBL11786743 0.85 CA12 (0.58) MEN1KMT2ATSHRCA12CA1
SCHEMBL27722648 0.83 MEN1 (0.52) MEN1KMT2ATSHRCA12CA1
SCHEMBL28391493 0.82 SMN1; SMN2 (0.60) MEN1KMT2ATSHRCA12CA1
SCHEMBL973742 0.82 MEN1 (0.59) MEN1KMT2ATSHRCA12CA1
SCHEMBL29599456 0.82 KDM4E (0.68) MEN1KMT2ATSHRCA12CA1
Benzene SCHEMBL10558251 0.82 KDM4E (0.68) MEN1KMT2ATSHRCA12CA1
SCHEMBL70004 0.82 KDM4E (0.68) MEN1KMT2ATSHRCA12CA1
SCHEMBL28051400 0.82 NR4A2 (0.50) MEN1KMT2ATSHRCA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1640804-B1 Positive-tone radiation-sensitive resin composition JSR CORP (JP) 2008-11-19 EP disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7335457-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-02-26 US disclosed
US-20060078821-A1 A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication JSR CORPORATION (JP) 2006-04-13 US disclosed
EP-1640804-A2 Positive-tone radiation-sensitive resin composition JSR Corporation (JP) 2006-03-29 EP disclosed