SCHEMBL3197587

SCHEMBL3197587

CC(C)(C)Oc1cc(OC(C)(C)C)c([S+](c2ccccc2)c2ccccc2)c(OC(C)(C)C)c1.O=S(=O)([O-])c1c(C(F)(F)F)cc(C(F)(F)F)cc1C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
POLQ O75417 1/20 0.30
ABCB11 O95342 1/20 0.30
PTGDR2 Q9Y5Y4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3183476 0.92 SLC22A12 (0.31) ABCB11PTGDR2
SCHEMBL3183550 0.90 KDM4E (0.32) POLQPTGDR2
SCHEMBL3201793 0.90 ABCB11 (0.36) POLQABCB11PTGDR2
SCHEMBL3192962 0.88 POLQ (0.32) POLQ
SCHEMBL3181675 0.88 HSD11B1 (0.31)
SCHEMBL3200897 0.87 PTGDR2 (0.36) PTGDR2
SCHEMBL3195094 0.86
SCHEMBL3182663 0.84 SLC6A9 (0.31)
SCHEMBL3192415 0.83 SLC6A9 (0.30)
SCHEMBL3191633 0.81 ABCB11 (0.37) ABCB11PTGDR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed