⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31005113 | 1.00 | — | — | |
| SCHEMBL30804779 | 0.95 | — | — | |
| SCHEMBL3188754 | 0.95 | — | — | |
| SCHEMBL3211917 | 0.84 | TAAR1 (0.33) | — | |
| SCHEMBL31005101 | 0.72 | TSHR (0.45) | — | |
| SCHEMBL3201226 | 0.72 | TSHR (0.45) | — | |
| SCHEMBL10801908 | 0.71 | ALDH1A1 (0.40) | — | |
| SCHEMBL47554 | 0.71 | ALDH1A1 (0.40) | — | |
| SCHEMBL7646743 | 0.70 | TSHR (0.43) | — | |
| SCHEMBL3190241 | 0.70 | ALDH1A1 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-23 | — | — | US | disclosed |
| US-8435717-B2 | Compound for photoacid generator, resist composition using the same, and pattern-forming method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-07 | — | — | US | disclosed |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | TOYO GOSEI CO., LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| US-7414148-B2 | Process for producing alkoxycarbonylfluoroalkanesulfonates | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-19 | — | — | US | disclosed |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-05-08 | — | — | US | disclosed |