SCHEMBL3201226

SCHEMBL3201226

Clc1ccccc1[S+](c1ccccc1)c1ccccc1Cl

nearest known ligand 0.45

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.45
LMNA P02545 1/20 0.45
CYP2A6 P11509 4/20 0.39
ALDH1A1 P00352 3/20 0.36
CYP1A2 P05177 3/20 0.33
IDO1 P14902 3/20 0.33
POLB P06746 1/20 0.33
KCNN4 O15554 1/20 0.32
CES2 O00748 1/20 0.32
CES1 P23141 1/20 0.32
PNMT P11086 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31005101 1.00 TSHR (0.45) TSHRLMNACYP2A6ALDH1A1CYP1A2
SCHEMBL2222737 0.95 TSHR (0.45) TSHRLMNACYP2A6ALDH1A1CYP1A2
SCHEMBL31005119 0.95 TSHR (0.45) TSHRLMNACYP2A6ALDH1A1CYP1A2
SCHEMBL31005108 0.83 TSHR (0.56) TSHRLMNACYP2A6ALDH1A1CYP1A2
SCHEMBL1011168 0.83 TSHR (0.56) TSHRLMNACYP2A6ALDH1A1CYP1A2
SCHEMBL30133368 0.80 TP53 (0.41) TSHRLMNACYP2A6ALDH1A1CYP1A2
SCHEMBL9316516 0.75 TSHR (0.41) TSHRLMNACYP2A6ALDH1A1CYP1A2
SCHEMBL10801908 0.73 ALDH1A1 (0.40) TSHRLMNACYP2A6ALDH1A1
SCHEMBL47554 0.73 ALDH1A1 (0.40) TSHRLMNACYP2A6ALDH1A1
SCHEMBL3198452 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180011401-A1 SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD TOYO GOSEI CO., LTD. (JP) 2018-01-11 US disclosed
US-9714217-B2 Sulfonic acid derivative and photoacid generator TOYO GOSEI CO., LTD. (JP) 2017-07-25 US disclosed
US-20130130175-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method CENTRAL GLASS COMPANY, LIMITED (JP) 2013-05-23 US disclosed
US-8435717-B2 Compound for photoacid generator, resist composition using the same, and pattern-forming method CENTRAL GLASS COMPANY, LIMITED (JP) 2013-05-07 US disclosed
US-20120289738-A1 SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR TOYO GOSEI CO., LTD. (JP) 2012-11-15 US disclosed
US-20100035185-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method CENTRAL GLASS COMPANY, LTD. (JP) 2010-02-11 US disclosed
US-7414148-B2 Process for producing alkoxycarbonylfluoroalkanesulfonates CENTRAL GLASS COMPANY LIMITED (JP) 2008-08-19 US disclosed
US-20080108846-A1 PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES CENTRAL GLASS COMPANY, LIMITED (JP) 2008-05-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180011401-A1 SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD ASIC1, ASIC3, CRY1 TSHR 2626/4885LMNA 4638/4885CYP2A6 227/4885
US-20080108846-A1 PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES ARSA, PFAS, MPST TSHR 3426/4885LMNA 4520/4885CYP2A6 374/4885
US-20100035185-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method ASIC1, RER1, INSRR TSHR 1202/4885LMNA 4726/4885CYP2A6 1406/4885
US-20120289738-A1 SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR CRY1, ASIC1, ASIC3 TSHR 1768/4885LMNA 4547/4885CYP2A6 83/4885
US-20130130175-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method ASIC1, RER1, INSRR TSHR 988/4885LMNA 4640/4885CYP2A6 1821/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.