SCHEMBL3200057

SCHEMBL3200057

CC(C)(C)OC(=O)COc1ccc([S+](c2ccccc2)c2ccccc2)cc1.CCCCCCCCS(=O)(=O)[O-]

nearest known ligand 0.47

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PSEN1 P49768 3/20 0.47
PSEN2 P49810 3/20 0.47
APH1B Q8WW43 3/20 0.47
NCSTN Q92542 3/20 0.47
APH1A Q96BI3 3/20 0.47
PSENEN Q9NZ42 3/20 0.47
PTPN1 P18031 1/20 0.44
PLA2G4B P0C869 13/20 0.41
PLA2G4A P47712 1/20 0.39
MAPT P10636 2/20 0.37
NPSR1 Q6W5P4 2/20 0.37
LMNA P02545 1/20 0.37
POLB P06746 1/20 0.37
CYP2C9 P11712 1/20 0.37
HPGD P15428 1/20 0.37
CYP2C19 P33261 1/20 0.37
GAA P10253 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8319088 0.87 PTPN1 (0.52) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL3201051 0.86 PSEN1 (0.44) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL3190513 0.84 PTPN1 (0.49) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL133377 0.83 PTPN1 (0.51) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL8323320 0.83 PTPN1 (0.51) PSEN1PSEN2APH1BNCSTNAPH1A
Trifluoromethanesulfonic Acid SCHEMBL3197613 0.83 PTPN1 (0.48) PSEN1PSEN2APH1BNCSTNAPH1A
Trifluoromethanesulfonic Acid SCHEMBL8862138 0.83 PTPN1 (0.48) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL2903862 0.82 PABPC1 (0.36)
SCHEMBL8651582 0.82 PTPN1 (0.46) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL8320132 0.82 PSEN1 (0.48) PSEN1PSEN2APH1BNCSTNAPH1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed