Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | MLYCD | O95822 | 1/20 | 0.33 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.32 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.32 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoroacetic Acid SCHEMBL1131909 | 0.87 | TP53 (0.36) | TP53MLYCDCHRM2CHRM4CHRM5 | |
| Trifluoroacetic Acid SCHEMBL5874606 | 0.82 | TP53 (0.36) | TP53MLYCD | |
| Trifluoroacetic Acid SCHEMBL3140803 | 0.81 | TP53 (0.44) | TP53 | |
| Trifluoroacetic Acid SCHEMBL27714775 | 0.81 | TP53 (0.44) | TP53 | |
| Trifluoroacetic Acid SCHEMBL8588154 | 0.79 | CHRM2 (0.44) | TP53CHRM2CHRM4CHRM5CHRM1 | |
| Trifluoroacetic Acid SCHEMBL7793452 | 0.78 | TP53 (0.42) | TP53MLYCD | |
| Trifluoroacetic Acid SCHEMBL7209644 | 0.78 | ALDH1A1 (0.35) | TP53MLYCDCHRM2CHRM4CHRM5 | |
| Trifluoroacetic Acid SCHEMBL1035693 | 0.78 | TP53 (0.42) | TP53MLYCD | |
| Trifluoroacetic Acid SCHEMBL3591146 | 0.78 | ALDH1A1 (0.39) | TP53CHRM2CHRM4CHRM5CHRM1 | |
| Trifluoroacetic Acid SCHEMBL1833665 | 0.76 | TP53 (0.40) | TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150344826-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ENTEGRIS, INC. | 2015-12-03 | — | — | US | claimed |
| US-9109188-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-08-18 | — | — | US | claimed |
| US-20130072411-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-03-21 | — | — | US | claimed |
| US-8293694-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-10-23 | — | — | US | claimed |
| EP-1381656-B1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECH MATERIALS (US) | 2010-11-10 | — | — | EP | claimed |
| US-20100035785-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS INC. (US) | 2010-02-11 | — | — | US | claimed |
| US-7605113-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS INC. (US) | 2009-10-20 | — | — | US | claimed |
| EP-1446460-A4 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECH MATERIALS (US) | 2009-08-19 | — | — | EP | claimed |
| US-6896826-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2005-05-24 | — | — | US | claimed |
| EP-1446460-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2004-08-18 | — | — | EP | claimed |
| WO-2003035797-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-05-01 | — | — | WO | claimed |
| US-20030078173-A1 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ENTEGRIS, INC. | 2003-04-24 | — | — | US | claimed |
| US-20150344826-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ENTEGRIS, INC. | 2015-12-03 | — | — | US | disclosed |
| US-9109188-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-08-18 | — | — | US | disclosed |
| US-8999363-B2 | Methods and compositions for antimicrobial surfaces | SISHIELD TECHNOLOGIES, INC. (US) | 2015-04-07 | — | — | US | disclosed |
| US-8999357-B2 | Methods and compositions for biocidal treatments | SISHIELD TECHNOLOGIES, INC. (US) | 2015-04-07 | — | — | US | disclosed |
| WO-2003035797-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-05-01 | — | — | WO | disclosed |
| US-20030078173-A1 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ENTEGRIS, INC. | 2003-04-24 | — | — | US | disclosed |
| WO-2002077120-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2002-10-03 | — | — | WO | disclosed |
| US-20010050350-A1 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS INC. | 2001-12-13 | — | — | US | disclosed |