SCHEMBL3202413

SCHEMBL3202413

CC(C#N)/N=N/C(C)(C)C#N

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3202417 1.00 TSHR (0.30) TSHR
SCHEMBL11309754 0.80
SCHEMBL11309750 0.80
SCHEMBL28120533 0.77 TSHR (0.50) TSHR
SCHEMBL14764368 0.76
Ammonia Solution, Strong SCHEMBL28204319 0.75 TSHR (0.47) TSHR
SCHEMBL122 0.73
Water SCHEMBL21518539 0.73
SCHEMBL6522063 0.73
SCHEMBL268471 0.73 TSHR (0.47) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160291468-A1 PHOTOSENSITIVE TRANSFER MATERIAL, PATTERN FORMATION METHOD, AND ETCHING METHOD FUJIFILM CORPORATION (JP) 2016-10-06 US disclosed
US-20100039034-A1 PHOTOCURABLE CONDUCTIVE PASTE AND PHOTOCURABLE BLACK PASTE USED IN FORMATION OF BUS ELECTRODE HAVING DOUBLE LAYER STRUCTURE, AND PLASMA DISPLAY PANEL ITO HIDEYUKI 2010-02-18 US disclosed
US-20090053483-A1 PHOTOCURABLE CONDUCTIVE PASTE AND PHOTOCURABLE BLACK PASTE USED IN FORMATION OF BUS ELECTRODE HAVING DOUBLE LAYER STRUCTURE, AND PLASMA DISPLAY PANEL TAIYO INK MFG. CO., LTD. (JP) 2009-02-26 US disclosed
US-7238763-B2 Unsaturated monocarboxylic ester compounds KANAGAWA UNIVERSITY AND TAIYO INK MANUFACTURING CO., LTD. (JP) 2007-07-03 US disclosed
US-7226710-B2 Photocurable/therosetting resin composition, photosensitive dry film formed therefrom and method of forming pattern with the same KANAGAWA UNIVERSITY (JP) 2007-06-05 US disclosed
US-7208568-B2 Resin curable with actinic radiation, process for the production thereof, and photocurable and thermosetting resin composition KANAGAWA UNIVERSITY (JP) 2007-04-24 US disclosed
EP-1251118-B1 UNSATURATED MONOCARBOXYLIC ESTER COMPOUND, PROCESS FOR PRODUCING THE SAME, AND COMPOSITION CURABLE WITH ACTINIC ENERGY RAY UNIV KANAGAWA (JP) 2006-12-20 EP disclosed
US-7132168-B2 Resin curable with actinic radiation, process for the production thereof, and photocurable and thermosetting resin composition KANAGAWA UNIVERSITY (JP) 2006-11-07 US disclosed
US-7057063-B2 Unsaturated carboxylic ester compound, process for producing the same, and composition curable with actinic energy ray KANAGAWA UNIVERSITY (JP) 2006-06-06 US disclosed
US-20060030636-A1 Unsaturated carboxylic ester compound, process for producing the same, and composition curable with actinic energy ray KANAGAWA UNIVERSITY 2006-02-09 US disclosed
EP-1275665-A1 RESINS CURABLE WITH ACTINIC RADIATION, PROCESS FOR THE PRODUCTION THEREOF, AND PHOTO- AND THERMO-SETTING RESIN COMPOSITION Kanagawa University (JP) 2003-01-15 EP disclosed
EP-1276011-A1 PHOTOCURABLE/THERMOSETTING RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM FORMED THEREFROM, AND METHOD OF FORMING PATTERN WITH THE SAME Kanagawa University (JP) 2003-01-15 EP disclosed
US-20030009053-A1 Unsaturated monocarboxylic ester compound, process for producing the same, and composition curable with actinic energy ray KANAGAWA UNIVERSITY (JP) 2003-01-09 US disclosed
EP-1251118-A1 UNSATURATED MONOCARBOXYLIC ESTER COMPOUND, PROCESS FOR PRODUCING THE SAME, AND COMPOSITION CURABLE WITH ACTINIC ENERGY RAY Kanagawa University (JP) 2002-10-23 EP disclosed
US-H1582-H Process for preparation of chlorinated and chlorosulfonated olefin polymers having low levels of residual monofluorobenzene reaction solvent and its chlorinated by-products E. I. DU PONT DE NEMOURS AND COMPANY (US) 1996-08-06 US disclosed
US-5525651-A CONTAINS EPOXY RESIN, STYRENIC COPOLYMER, AND ANTIMONY COMPOUND; IMPACT STRENGTH, HEAT RESISTANCE THE DOW CHEMICAL COMPANY (US) 1996-06-11 US disclosed
EP-0706534-A1 PROCESS FOR PREPARATION OF CHLORINATED AND CHLOROSULFONATED OLEFIN POLYMERS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1996-04-17 EP disclosed
US-5457146-A Impact strength, heat resistance, ignition resistance THE DOW CHEMICAL COMPANY (US) 1995-10-10 US disclosed
US-5424341-A A molding material comprising a styrenic copolymer amd epoxy resins; impact and ignition resistance, heat resistance, paintability; films, sheets, instrumentral panels, housings and parts for electronics, automobiles THE DOW CHEMICAL COMPANY (US) 1995-06-13 US disclosed
WO-1995001380-A1 PROCESS FOR PREPARATION OF CHLORINATED AND CHLOROSULFONATED OLEFIN POLYMERS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1995-01-12 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030009053-A1 Unsaturated monocarboxylic ester compound, process for producing the same, and composition curable with actinic energy ray ACSL1, ACSL6, ACSL4 TSHR 4262/4885
US-20060030636-A1 Unsaturated carboxylic ester compound, process for producing the same, and composition curable with actinic energy ray ACSL1, ACSL6, ACSL3 TSHR 3538/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.