SCHEMBL3203462

SCHEMBL3203462

O=COS(=O)(=O)Oc1cccc2ccccc12

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.41
KDM4E B2RXH2 3/20 0.41
HSD17B10 Q99714 3/20 0.41
HPGD P15428 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
PGR P06401 1/20 0.39
GAA P10253 1/20 0.39
PTGS1 P23219 1/20 0.39
MAPK1 P28482 1/20 0.39
HTR1B P28222 5/20 0.39
KMT2A Q03164 3/20 0.38
MEN1 O00255 2/20 0.38
CYP1A2 P05177 2/20 0.38
CYP2C19 P33261 2/20 0.38
RAB9A P51151 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA9 Q16790 1/20 0.38
MAPT P10636 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28239226 0.85 ALDH1A1 (0.36) ALDH1A1KDM4EHSD17B10HPGDGAA
SCHEMBL2316712 0.85 ALDH1A1 (0.47) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL3482649 0.81 ALDH1A1 (0.43) ALDH1A1KDM4EHPGDGAAKMT2A
SCHEMBL311749 0.79 ALDH1A1 (0.42) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL28600804 0.79 ALDH1A1 (0.45) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL29037273 0.79 ALDH1A1 (0.42) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL1692540 0.77 ALDH1A1 (0.47) ALDH1A1KDM4EHSD17B10HPGDTDP1
Ethylenediamine SCHEMBL27862580 0.77 HTR1B (0.61) ALDH1A1KDM4EHPGDTDP1HTR1B
SCHEMBL28020558 0.77 ALDH1A1 (0.45) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL1253062 0.77 ALDH1A1 (0.41) ALDH1A1KDM4EHSD17B10HPGDTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7678326-B2 Method and apparatus for manufacturing fine particles KABUSHIKI KAISHA TOSHIBA (JP) 2010-03-16 US disclosed
US-7297323-B2 Method and apparatus for manufacturing fine particles KABUSHIKI KAISHA TOSHIBA (JP) 2007-11-20 US disclosed
US-20070246868-A1 METHOD AND APPARATUS FOR MANUFACTURING FINE PARTICLES KABUSHIKI KAISHA TOSHIBA (JP) 2007-10-25 US disclosed
EP-1839055-A2 ASSAY METHOD AND APPARATUS WITH REDUCED SAMPLE MATRIX EFFECTS BioVeris Corporation (US) 2007-10-03 EP disclosed
US-20060275841-A1 Assay method and apparatus with reduced sample matrix effects BIOVERIS CORPORATION 2006-12-07 US disclosed
WO-2006069023-A2 ASSAY METHOD AND APPARATUS WITH REDUCED SAMPLE MATRIX EFFECTS BIOVERIS (US) 2006-06-29 WO disclosed
EP-0997514-B1 Rosin containing emulsion for pressure-sensitive adhesive NIPPON CATALYTIC CHEM IND (JP) 2003-07-30 EP disclosed
US-20030059354-A1 Method and apparatus for manufacturing fine particles KABUSHIKI KAISHA TOSHIBA (JP) 2003-03-27 US disclosed
US-6518342-B1 Exhibits high adhesive strength to hard-to-adhere adherend such as polyolefin, high resistance to water, and high cohesive strength NIPPON SHOKUBAI CO., LTD. (JP) 2003-02-11 US disclosed
EP-0997514-A1 Rosin containing emulsion for pressure-sensitive adhesive NIPPON SHOKUBAI CO., LTD. (JP) 2000-05-03 EP disclosed