⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1712918 | 0.87 | ALOX5 (0.38) | — | |
| SCHEMBL1735458 | 0.83 | KMT2A (0.38) | — | |
| SCHEMBL644021 | 0.79 | KMT2A (0.42) | — | |
| SCHEMBL2533403 | 0.78 | TET2 (0.36) | — | |
| SCHEMBL1134203 | 0.78 | — | — | |
| SCHEMBL4610177 | 0.77 | EPHX1 (0.45) | — | |
| SCHEMBL643110 | 0.77 | EPHX1 (0.45) | — | |
| SCHEMBL10814953 | 0.77 | EPHX1 (0.45) | — | |
| SCHEMBL111091 | 0.77 | EPHX1 (0.45) | — | |
| SCHEMBL10818793 | 0.76 | CYP1A2 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7608390-B2 | Photoresists; for immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-10-27 | — | — | US | claimed |
| US-8304178-B2 | Top antireflective coating composition containing hydrophobic and acidic groups | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-06 | — | — | US | disclosed |
| US-20100047712-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-02-25 | — | — | US | disclosed |