SCHEMBL3215937

SCHEMBL3215937

CC(C)C=C(CC12CC3CC(CC(C3)C1)C2)C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.50
NPSR1 Q6W5P4 1/20 0.48
ALDH1A1 P00352 5/20 0.46
GRIK1 P39086 2/20 0.41
GRIA2 P42262 2/20 0.41
GRIA4 P48058 2/20 0.41
GRIK3 Q13003 2/20 0.41
GRIK5 Q16478 2/20 0.41
GRIA1 P42261 1/20 0.41
GRIK2 Q13002 1/20 0.41
BPTF Q12830 1/20 0.40
P2RX7 Q99572 2/20 0.40
HSD11B1 P28845 1/20 0.39
CYP3A4 P08684 1/20 0.38
CYP2C19 P33261 1/20 0.38
EPHX2 P34913 1/20 0.38
TSHR P16473 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL596453 0.82 ALDH1A1 (0.52) SMN1; SMN2NPSR1ALDH1A1BPTFP2RX7
SCHEMBL906382 0.79 ALDH1A1 (0.47) SMN1; SMN2NPSR1ALDH1A1BPTFP2RX7
SCHEMBL595457 0.78 ALDH1A1 (0.47) SMN1; SMN2NPSR1ALDH1A1GRIK1GRIK2
SCHEMBL6125488 0.78 ALDH1A1 (0.47) SMN1; SMN2NPSR1ALDH1A1GRIK1GRIK2
SCHEMBL3207196 0.76 ALDH1A1 (0.47) SMN1; SMN2NPSR1ALDH1A1BPTFP2RX7
SCHEMBL4104059 0.72 ALDH1A1 (0.41) SMN1; SMN2NPSR1ALDH1A1BPTFP2RX7
SCHEMBL15113225 0.71 ALDH1A1 (0.55) SMN1; SMN2NPSR1ALDH1A1BPTFP2RX7
SCHEMBL3420033 0.70 ALDH1A1 (0.37) SMN1; SMN2NPSR1ALDH1A1BPTFP2RX7
SCHEMBL14687892 0.70 ALDH1A1 (0.41) SMN1; SMN2NPSR1ALDH1A1BPTFP2RX7
Adamantaneacetic Acid SCHEMBL24688608 0.69 ALDH1A1 (0.62) SMN1; SMN2NPSR1ALDH1A1BPTFP2RX7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2597518-B1 Compositions and antireflective coatings for photolithography DOW GLOBAL TECHNOLOGIES LLC (US) 2016-12-07 EP disclosed
US-9011591-B2 Compositions and antireflective coatings for photolithography DOW GLOBAL TECHNOLOGIES LLC (US) 2015-04-21 US disclosed
US-8808974-B2 Method for forming pattern JSR CORPORATION (JP) 2014-08-19 US disclosed
EP-2597518-A2 Compositions and antireflective coatings for photolithography Dow Global Technologies LLC (US) 2013-05-29 EP disclosed
US-20130071560-A1 COMPOSITIONS AND ANTIREFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-03-21 US disclosed
US-20100068650-A1 POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION JSR CORPORATION (JP) 2010-03-18 US disclosed