Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.45 |
| ▸ | BPTF | Q12830 | 1/20 | 0.44 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.44 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL906382 | 0.85 | ALDH1A1 (0.47) | ALDH1A1SMN1; SMN2NPSR1BPTFP2RX7 | |
| SCHEMBL6125488 | 0.84 | ALDH1A1 (0.47) | ALDH1A1SMN1; SMN2NPSR1BPTFP2RX7 | |
| SCHEMBL595457 | 0.84 | ALDH1A1 (0.47) | ALDH1A1SMN1; SMN2NPSR1BPTFP2RX7 | |
| SCHEMBL5669515 | 0.83 | GAA (0.49) | ALDH1A1GAAMEN1KMT2ATSHR | |
| SCHEMBL3215937 | 0.82 | SMN1; SMN2 (0.50) | ALDH1A1SMN1; SMN2NPSR1BPTFP2RX7 | |
| SCHEMBL3207196 | 0.81 | ALDH1A1 (0.47) | ALDH1A1SMN1; SMN2NPSR1BPTFP2RX7 | |
| SCHEMBL4104059 | 0.77 | ALDH1A1 (0.41) | ALDH1A1SMN1; SMN2NPSR1BPTFP2RX7 | |
| SCHEMBL14687892 | 0.75 | ALDH1A1 (0.41) | ALDH1A1SMN1; SMN2NPSR1BPTFP2RX7 | |
| Adamantaneacetic Acid SCHEMBL24688608 | 0.74 | ALDH1A1 (0.62) | ALDH1A1SMN1; SMN2NPSR1BPTFP2RX7 | |
| Adamantaneacetic Acid SCHEMBL306081 | 0.74 | ALDH1A1 (0.62) | ALDH1A1SMN1; SMN2NPSR1BPTFP2RX7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 163 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11480878-B2 | Monomers, polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2022-10-25 | — | — | US | disclosed |
| US-20210294148-A1 | Planarizing Organic Films | TOKYO ELECTRON LIMITED (JP) | 2021-09-23 | — | — | US | disclosed |
| WO-2021188352-A1 | PLANARIZING ORGANIC FILMS | TOKYO ELECTRON LIMITED (JP) | 2021-09-23 | — | — | WO | disclosed |
| EP-2420891-B1 | Process for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2021-06-23 | — | — | EP | disclosed |
| US-11016388-B2 | Overcoat compositions and methods for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2021-05-25 | — | — | US | disclosed |
| US-10558122-B2 | Compositions comprising sulfonamide material and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) | 2020-02-11 | — | — | US | disclosed |
| US-20190346763-A1 | COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-14 | — | — | US | disclosed |
| US-10474032-B2 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-12 | — | — | US | disclosed |
| US-10359698-B2 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-07-23 | — | — | US | disclosed |
| EP-1720072-B1 | Compositons and processes for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2019-06-05 | — | — | EP | disclosed |
| US-20030027061-A1 | Photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. | 2003-02-06 | — | — | US | disclosed |
| US-20030013049-A1 | Photoacid generator systems for short wavelength imaging | SHIPLEY COMPANY, L.L.C. | 2003-01-16 | — | — | US | disclosed |
| US-6482567-B1 | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. | 2002-11-19 | — | — | US | disclosed |
| WO-2002069040-A1 | NOVEL POLYMERS, PROCESSES FOR POLYMER SYNTHESIS AND PHOTORESIST COMPOSITIONS | SHIPLEY COMPANY, LLC (US) | 2002-09-06 | — | — | WO | disclosed |
| WO-2002069039-A2 | PHOTOACID GENERATOR SYSTEMS FOR SHORT WAVELENGTH IMAGING | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-06 | — | — | WO | disclosed |
| WO-2002042845-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-05-30 | — | — | WO | disclosed |
| US-20020058198-A1 | Fluorinated phenolic polymers and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. | 2002-05-16 | — | — | US | disclosed |
| WO-2002021212-A2 | FLUORINATED PHENOLIC POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-14 | — | — | WO | disclosed |
| WO-2002019033-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-07 | — | — | WO | disclosed |
| WO-2002017019-A2 | OXIME SULFONATE AND N-OXYIMIDOSULFONATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-02-28 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11016388-B2 | Overcoat compositions and methods for photolithography | OGT, COLGALT1, PARG | ALDH1A1 2382/4885SMN1; SMN2 4742/4885NPSR1 3021/4885 |
| US-11480878-B2 | Monomers, polymers and photoresist compositions | PARG, LCP1, ALG3 | ALDH1A1 894/4885SMN1; SMN2 1549/4885NPSR1 1994/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.