Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.47 |
| ▸ | BPTF | Q12830 | 1/20 | 0.44 |
| ▸ | P2RX7 | Q99572 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.39 |
| ▸ | GLA | P06280 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL596453 | 0.85 | ALDH1A1 (0.52) | ALDH1A1BPTFP2RX7SMN1; SMN2CYP3A4 | |
| SCHEMBL3207196 | 0.81 | ALDH1A1 (0.47) | ALDH1A1BPTFP2RX7SMN1; SMN2CYP3A4 | |
| SCHEMBL6125488 | 0.80 | ALDH1A1 (0.47) | ALDH1A1BPTFP2RX7SMN1; SMN2CYP3A4 | |
| SCHEMBL595457 | 0.80 | ALDH1A1 (0.47) | ALDH1A1BPTFP2RX7SMN1; SMN2CYP3A4 | |
| SCHEMBL3215937 | 0.79 | SMN1; SMN2 (0.50) | ALDH1A1BPTFP2RX7SMN1; SMN2CYP3A4 | |
| SCHEMBL14687892 | 0.75 | ALDH1A1 (0.41) | ALDH1A1BPTFP2RX7SMN1; SMN2CYP3A4 | |
| Adamantaneacetic Acid SCHEMBL24688608 | 0.74 | ALDH1A1 (0.62) | ALDH1A1BPTFP2RX7SMN1; SMN2CYP3A4 | |
| Adamantaneacetic Acid SCHEMBL6865701 | 0.74 | ALDH1A1 (0.62) | ALDH1A1BPTFP2RX7SMN1; SMN2CYP3A4 | |
| Adamantaneacetic Acid SCHEMBL306081 | 0.74 | ALDH1A1 (0.62) | ALDH1A1BPTFP2RX7SMN1; SMN2CYP3A4 | |
| SCHEMBL1074062 | 0.74 | ALDH1A1 (0.57) | ALDH1A1BPTFP2RX7SMN1; SMN2CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 216 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122011265-A | Novel terpolymer photoresist resin and application thereof | 宁波南大光电材料有限公司 | 2026-05-12 | — | — | CN | claimed |
| EP-2554555-B1 | METHODS FOR PRODUCING AN ADAMANTYL (METH)ACRYLATE MONOMER AND A (METH)ACRYLIC COPOLYMER THAT CONTAINS REPEATING UNITS DERIVED FROM THE MONOMER | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-09-18 | — | — | EP | claimed |
| EP-2742385-A2 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | International Business Machines Corporation (US) | 2014-06-18 | — | — | EP | claimed |
| US-8715907-B2 | Developable bottom antireflective coating compositions for negative resists | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-06 | — | — | US | claimed |
| US-20130040238-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-02-14 | — | — | US | claimed |
| WO-2013023124-A2 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-02-14 | — | — | WO | claimed |
| EP-2287671-B1 | Process for forming a coated substrate | COMMW SCIENT IND RES ORG (AU) | 2012-06-06 | — | — | EP | claimed |
| US-20110309308-A1 | COMPOSITE CONDUCTIVE POLYMER COMPOSITION, METHOD OF MANUFACTURING THE SAME, SOLUTION CONTAINING THE COMPOSITION, USE OF THE COMPOSITION | SOKEN CHEMICAL & ENGINEERING CO., LTD. (JP) | 2011-12-22 | — | — | US | claimed |
| EP-1664927-B1 | LOW-POLYDISPERSITY PHOTOIMAGEABLE ACRYLIC POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | COMMW SCIENT IND RES ORG (AU) | 2011-04-06 | — | — | EP | claimed |
| EP-2287671-A1 | Process for forming a coated substrate | Commonwealth Scientific and Industrial Research Organisation (AU) | 2011-02-23 | — | — | EP | claimed |
| US-20050019696-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-01-27 | — | — | US | claimed |
| US-20050014095-A1 | Sulfonate and a resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-01-20 | — | — | US | claimed |
| EP-1041442-B1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL CO (JP) | 2004-10-27 | — | — | EP | claimed |
| US-6806026-B2 | POLYMER OF A FLUORINATED HYDROXYALKYL ACRYLATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-10-19 | — | — | US | claimed |
| US-20040152009-A1 | Sulfonate and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-08-05 | — | — | US | claimed |
| US-20030224283-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-04 | — | — | US | claimed |
| EP-1143299-B1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2003-07-16 | — | — | EP | claimed |
| US-6537726-B2 | Polymeric unit derived from 3-hydroxy-1-adamantyl(meth)acrylate and polymeric unit derived from beta-(meth)acryloyloxy-gamma-butyrolactone; adhesion, sensitivity, resolution | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-03-25 | — | — | US | claimed |
| US-20010016298-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-23 | — | — | US | claimed |
| EP-1122604-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-08 | — | — | EP | claimed |