Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | METAP2 | P50579 | 1/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 5/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | RAD52 | P43351 | 2/20 | 0.44 |
| ▸ | PIM1 | P11309 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.41 |
| ▸ | GLA | P06280 | 3/20 | 0.41 |
| ▸ | MAOA | P21397 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | CASP1 | P29466 | 2/20 | 0.41 |
| ▸ | CASP7 | P55210 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.41 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.41 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.41 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.41 |
| ▸ | NQO2 | P16083 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29660606 | 1.00 | METAP2 (0.54) | METAP2CYP3A4KMT2ARAD52PIM1 | |
| SCHEMBL9875643 | 0.84 | METAP2 (0.48) | METAP2CYP3A4KMT2ARAD52PIM1 | |
| SCHEMBL22470160 | 0.81 | PIM1 (0.46) | METAP2CYP3A4KMT2APIM1ALDH1A1 | |
| SCHEMBL21560819 | 0.81 | PIM1 (0.46) | METAP2CYP3A4PIM1ALDH1A1KDM4E | |
| SCHEMBL21560905 | 0.81 | PIM1 (0.46) | METAP2CYP3A4PIM1ALDH1A1KDM4E | |
| SCHEMBL21560750 | 0.81 | PIM1 (0.46) | METAP2CYP3A4PIM1ALDH1A1KDM4E | |
| SCHEMBL21560825 | 0.81 | PIM1 (0.46) | METAP2CYP3A4PIM1ALDH1A1KDM4E | |
| SCHEMBL29488283 | 0.80 | METAP1 (0.58) | METAP2KMT2AALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL321429 | 0.80 | METAP1 (0.58) | METAP2KMT2AALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL24433150 | 0.80 | PIM1 (0.45) | METAP2CYP3A4KMT2APIM1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106233205-B | Photosensitive element, laminate, permanent mask resist, method for producing same, and method for producing semiconductor package | 日立化成株式会社 | 2020-06-23 | — | — | CN | claimed |
| CN-101290471-B | Photoresist combination and laminating body | ASAHI KASEI EMD CORP | 2011-07-06 | — | — | CN | claimed |
| CN-101290471-A | Photoresist combination and laminating body | ASAHI KASEI EMD CORP (JP) | 2008-10-22 | — | — | CN | claimed |
| CN-111315828-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-09-29 | — | — | CN | disclosed |
| CN-112154167-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-08-22 | — | — | CN | disclosed |
| CN-110114376-B | Curable composition, method for producing cured product, cured product thereof, and adhesive using same | 株式会社ADEKA | 2022-06-14 | — | — | CN | disclosed |
| EP-3339331-B1 | COMPOSITION | ADEKA CORP (JP) | 2022-02-16 | — | — | EP | disclosed |
| CN-108419438-B | Coloring composition | 株式会社艾迪科 | 2021-10-01 | — | — | CN | disclosed |
| US-11054744-B2 | Photosensitive element, laminate, permanent mask resist, method for producing same, and method for producing semiconductor package | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2021-07-06 | — | — | US | disclosed |
| CN-112154167-A | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2020-12-29 | — | — | CN | disclosed |
| CN-111566173-A | Coating composition, method for curing the composition, barrier film, and method for producing cured product | 株式会社艾迪科 | 2020-08-21 | — | — | CN | disclosed |
| CN-101194191-A | Process for producing color filter, color filter, liquid crystal display element, and liquid crystal display device | FUJI FILM CORP (JP) | 2008-06-04 | — | — | CN | disclosed |
| CN-101101444-A | Light-sensitive resin composition, light-sensitive transfer printing material, separating wall and manufacturing method thereof, color filter and manufacturing method thereof, and displaying device | FUJIFILM CORP (JP) | 2008-01-09 | — | — | CN | disclosed |
| WO-2007089040-A1 | LIQUID CRYSTAL DISPLAY DEVICE AND COLOR FILM PLATE, AND PROCESSES FOR PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2007-08-09 | — | — | WO | disclosed |
| CN-1721991-A | Production method for photosensitive resin composition and element and related members | HITACHI CHEMICAL CO LTD (JP) | 2006-01-18 | — | — | CN | disclosed |
| CN-1228688-C | Photosensitive resin composition, photosensitive element, method for producing protective layer pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD (JP) | 2005-11-23 | — | — | CN | disclosed |
| CN-1432141-A | Photosensitive resin composition, photosensitive element, method for producing protective layer pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD (JP) | 2003-07-23 | — | — | CN | disclosed |
| EP-0305545-B1 | SUBSTITUTED ACRIDINE DERIVATIVES AND THEIR USE | Hitachi Chemical Co., Ltd. (JP) | 1993-02-10 | — | — | EP | disclosed |
| US-5045433-A | Photopolymerization initiators | HITACHI CHEMICAL CO., LTD. (JP) | 1991-09-03 | — | — | US | disclosed |
| EP-0305545-A1 | SUBSTITUTED ACRIDINE DERIVATIVES AND THEIR USE | Hitachi Chemical Co., Ltd. (JP) | 1989-03-08 | — | — | EP | disclosed |