⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7030922 | 0.84 | — | — | |
| SCHEMBL28041816 | 0.82 | CA2 (0.41) | — | |
| SCHEMBL28041948 | 0.82 | CA2 (0.41) | — | |
| SCHEMBL1081232 | 0.78 | — | — | |
| SCHEMBL29087027 | 0.77 | TSHR (0.41) | — | |
| SCHEMBL131555 | 0.77 | — | — | |
| SCHEMBL7852646 | 0.76 | — | — | |
| SCHEMBL27735593 | 0.74 | CES2 (0.39) | — | |
| SCHEMBL2166892 | 0.72 | — | — | |
| SCHEMBL1387656 | 0.72 | ALDH1A1 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7838201-B2 | Method for manufacturing a semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2010-11-23 | — | — | US | claimed |
| US-7534548-B2 | Polymer for immersion lithography and photoresist composition | HYNIX SEMICONDUCTOR INC. (KR) | 2009-05-19 | — | — | US | claimed |
| US-20060275695-A1 | Polymer for immersion lithography, photoresist composition containing the same, method of manufacturing a semiconductor device, and semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2006-12-07 | — | — | US | claimed |
| US-7083893-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-08-01 | — | — | US | claimed |
| US-20050026070-A1 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2005-02-03 | — | — | US | claimed |
| US-20040265735-A1 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2004-12-30 | — | — | US | claimed |
| WO-2024122681-A1 | PHOTOSENSITIVE RESIN AND PHOTORESIST COMPOSITION COMPRISING SAME | 타코마테크놀러스 주식회사 | 2024-06-13 | — | — | WO | disclosed |
| US-7838201-B2 | Method for manufacturing a semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2010-11-23 | — | — | US | disclosed |
| US-7803519-B2 | coating photoresist of poly(t-butyl acrylate/2,2,3,4,4,4-hexafluorobutyl acrylate/maleic anhydride/N-hydroxy-5-norbonene-2,3-dicarboxylmide perfluoro-1-butanesulfonate/2-hydroxyethyl bicycle[2,2,1]hept-5-ene-2-carboxylate on semiconductor underlayer; reduced surface tension, stable ion-implanting | HYNIX SEMICONDUCTOR INC. (KR) | 2010-09-28 | — | — | US | disclosed |
| CN-100557510-C | The method of photoresist polymkeric substance, photoetching compositions and manufacturing semiconductor device | HYNIX SEMICONDUCTOR INC (KR) | 2009-11-04 | — | — | CN | disclosed |
| US-20090258498-A1 | Method for Manufacturing a Semiconductor Device | HYNIX SEMICONDUCTOR INC. (KR) | 2009-10-15 | — | — | US | disclosed |
| US-20090191709-A1 | Method for Manufacturing a Semiconductor Device | HYNIX SEMICONDUCTOR INC. (KR) | 2009-07-30 | — | — | US | disclosed |
| US-7534548-B2 | Polymer for immersion lithography and photoresist composition | HYNIX SEMICONDUCTOR INC. (KR) | 2009-05-19 | — | — | US | disclosed |
| CN-1873533-A | Photoresist polymer, photoresist composition and method for manufacturing semiconductor device | HYNIX SEMICONDUCTOR INC (KR) | 2006-12-06 | — | — | CN | disclosed |
| US-7083893-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-08-01 | — | — | US | disclosed |
| US-7022458-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-04-04 | — | — | US | disclosed |
| US-20050026070-A1 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2005-02-03 | — | — | US | disclosed |
| US-20040265735-A1 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2004-12-30 | — | — | US | disclosed |
| US-6770415-B2 | ADHESION TO SUBSTRATE; FOR USE IN LITHOGRAPHY | HYNIX SEMICONDUCTOR INC. (KR) | 2004-08-03 | — | — | US | disclosed |
| US-20020061461-A1 | Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2002-05-23 | — | — | US | disclosed |