SCHEMBL3243255

SCHEMBL3243255

CCC[Si](CCCCCCCC[Si](CCC)(OC)OC)(OC)OC

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.34
TSHR P16473 1/20 0.30
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3241073 1.00 LMNA (0.34) LMNATSHRTHRB
SCHEMBL3237994 1.00 LMNA (0.34) LMNATSHRTHRB
SCHEMBL705813 0.97 LMNA (0.31) LMNA
SCHEMBL5570835 0.95 LMNA (0.41) LMNATSHRTHRB
SCHEMBL8852296 0.95 LMNA (0.41) LMNATSHRTHRB
SCHEMBL8852311 0.95 LMNA (0.41) LMNATSHRTHRB
SCHEMBL5387369 0.95 LMNA (0.41) LMNATSHRTHRB
SCHEMBL5572091 0.95 LMNA (0.41) LMNATSHRTHRB
SCHEMBL7636819 0.92 LMNA (0.38) LMNATSHRTHRB
SCHEMBL704672 0.92 LMNA (0.31) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2163664-A1 Method for depositing si-containing film, insulator film, and semiconductor device Shin-Etsu Chemical Co., Ltd. (JP) 2010-03-17 EP disclosed
US-20100061915-A1 METHOD FOR DEPOSITING SI-CONTAINING FILM, INSULATOR FILM, AND SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-11 US disclosed