SCHEMBL3244004

SCHEMBL3244004

C=CCn1nnnc1N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9441451 0.77
SCHEMBL7186864 0.77
SCHEMBL3245709 0.76
SCHEMBL22245499 0.76
SCHEMBL9367428 0.76 RAB9A (0.46)
SCHEMBL9547360 0.76
SCHEMBL1223690 0.76
SCHEMBL8937769 0.75 LMNA (0.47)
SCHEMBL1325460 0.74 RAB9A (0.45)
SCHEMBL5473058 0.74 CYP1A2 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8840798-B2 Chemical mechanical polishing slurry composition and method for producing semiconductor device using the same SOULBRAIN CO., LTD. (KR) 2014-09-23 US claimed
US-20120156874-A1 CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD (KR) 2012-06-21 US claimed
US-20100176335-A1 CMP Slurry Composition for Copper Damascene Process TECHNO SEMICHEM CO., LTD. (KR) 2010-07-15 US claimed
US-20100015807-A1 Chemical Mechanical Polishing Composition for Copper Comprising Zeolite TECHNO SEMICHEM CO., LTD. (KR) 2010-01-21 US claimed
US-20090298289-A1 Chemical Mechanical Polishing Composition for Copper Comprising Zeolite TECHNO SEMICHEM CO., LTD. (KR) 2009-12-03 US claimed
WO-2008150038-A1 CMP SLURRY COMPOSITION FOR COPPER DAMASCENE PROCESS TECHNO SEMICHEM CO., LTD. (KR) 2008-12-11 WO claimed
WO-2008078909-A1 CHEMICAL MECHANICAL POLISHING COMPOSITION FOR COPPER COMPRISING ZEOLITE TECHNO SEMICHEM CO., LTD. (KR) 2008-07-03 WO claimed
WO-2007114583-A1 CHEMICAL MECHANICAL POLISHING COMPOSITION FOR COPPER COMPRISING ZEOLITE TECHNO SEMICHEM CO., LTD. (KR) 2007-10-11 WO claimed
WO-2021080330-A1 NICOTINAMIDE COMPOUND AND HERBICIDAL COMPOSITION COMPRISING COMPOUND 한국화학연구원 2021-04-29 WO disclosed
CN-106715425-B Herbicidal quinolines 先正达参股股份有限公司 2020-11-06 CN disclosed
EP-3317267-A1 PYRIDAZINONES AS HERBICIDAL COMPOUNDS Syngenta Participations AG (CH) 2018-05-09 EP disclosed
EP-3307730-A1 HERBICIDAL COMPOUNDS Syngenta Participations AG (CH) 2018-04-18 EP disclosed
CN-107540622-A The alkylation of the hypoboric acid one of ten dihydro ten and the aminotetrazole salt of di 5 and preparation method thereof 北京理工大学 2018-01-05 CN disclosed
EP-3191465-A1 HERBICIDAL QUINOLINES Syngenta Participations AG (CH) 2017-07-19 EP disclosed
WO-2007114583-A1 CHEMICAL MECHANICAL POLISHING COMPOSITION FOR COPPER COMPRISING ZEOLITE TECHNO SEMICHEM CO., LTD. (KR) 2007-10-11 WO disclosed
US-4432986-A N-(TETRAZOL-5-YL)-(DIBENZOTHIOPHENE-, OR DIBENZOFURAN-, OR 1,3-BEZODIOXOLE-, OR NAPHTHALENE-)-4-CARBOXAMIDE RIKER LABORATORIES, INC. (US) 1984-02-21 US disclosed
EP-0081338-A1 N-(tetraxol-5-yl)phenazine-1-carboxamides RIKER LABORATORIES, INCORPORATED (US) 1983-06-15 EP disclosed
US-4377579-A ANTIALLERGENS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1983-03-22 US disclosed
US-4186201-A ANTIALLERGIC AGENTS RIKER LABORATORIES, INC. (US) 1980-01-29 US disclosed
US-4147694-A ANTIALLERGENS, ANTIHISTAMINES RIKER LABORATORIES, INC. (US) 1979-04-03 US disclosed