Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 2/20 | 0.44 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA5A | P35218 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | KCNH2 | Q12809 | 7/20 | 0.33 |
| ▸ | ACHE | P22303 | 4/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CES1 | P23141 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL29825847 | 0.98 | GPR3 (0.43) | GPR3PTPN1TSHRSMN1; SMN2HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL759937 | 0.92 | PTPN1 (0.41) | GPR3PTPN1TSHRSMN1; SMN2HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL37032 | 0.92 | GPR3 (0.50) | GPR3PTPN1TSHRHSD11B1CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL31155703 | 0.92 | GPR3 (0.50) | GPR3PTPN1TSHRHSD11B1CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL10008137 | 0.90 | GPR3 (0.48) | GPR3PTPN1HSD11B1CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6118365 | 0.90 | GPR3 (0.48) | GPR3PTPN1HSD11B1CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL2985949 | 0.87 | GPR3 (0.35) | GPR3PTPN1HSD11B1CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL4644224 | 0.87 | PTPN1 (0.38) | GPR3PTPN1CA1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL3413691 | 0.86 | GPR3 (0.37) | GPR3PTPN1HSD11B1CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL9680578 | 0.86 | GPR3 (0.42) | GPR3PTPN1CA1CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1597287-B1 | VINYL ADDITION POLYCYCLIC OLEFIN POLYMERS PREPARED WITH NON-OLEFINIC CHAIN TRANSFER AGENTS AND USES THEREOF | PROMERUS LLC (US) | 2010-05-05 | — | — | EP | claimed |
| EP-1830229-A2 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONIC CO. LTD. (KR) | 2007-09-05 | — | — | EP | disclosed |
| US-6897005-B2 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS, CO., LTD. (KR) | 2005-05-24 | — | — | US | disclosed |
| US-20040137363-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | CHOI SANG-JUN (KR) | 2004-07-15 | — | — | US | disclosed |
| US-6673513-B2 | COPOLYMER OF MALEIC ANHYDRIDE AND ALKYL VINYL ETHER OR UNSATURATED OXYGEN CONTAINING RINGS SUCH AS 3,4-DIHYDRO-2H-PYRAN, AND TERPOLYMERS WITH ACRYLATE HAVING ACID LABILE HYDROCARBON GROUP; ETCH RESISTANCE, GOOD ADHESION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-01-06 | — | — | US | disclosed |
| US-20030215758-A1 | Photosensitive polymer and chemically amplified resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-11-20 | — | — | US | disclosed |
| US-6517990-B1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-02-11 | — | — | US | disclosed |
| US-20010024763-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-27 | — | — | US | disclosed |
| EP-1120689-A2 | Photosensitive copolymers of alkyl vinyl ether and resist compositions containing the same | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-08-01 | — | — | EP | disclosed |