Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRB2 | P07550 | 4/20 | 0.50 |
| ▸ | MAOB | P27338 | 3/20 | 0.46 |
| ▸ | MAOA | P21397 | 3/20 | 0.46 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.44 |
| ▸ | PNMT | P11086 | 1/20 | 0.42 |
| ▸ | CPN1 | P15169 | 1/20 | 0.40 |
| ▸ | CPB2 | Q96IY4 | 1/20 | 0.40 |
| ▸ | TAAR1 | Q96RJ0 | 4/20 | 0.40 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.39 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.39 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.39 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.39 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.39 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.39 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7930021 | 0.96 | ADRB2 (0.47) | ADRB2MAOBMAOACYP19A1PNMT | |
| SCHEMBL1099930 | 0.96 | ADRB2 (0.47) | ADRB2MAOBMAOACYP19A1PNMT | |
| SCHEMBL8580067 | 0.91 | MAOA (0.52) | ADRB2MAOBMAOATAAR1SLC6A2 | |
| SCHEMBL10351218 | 0.91 | MAOA (0.53) | ADRB2MAOBMAOACYP19A1TAAR1 | |
| SCHEMBL1100916 | 0.91 | ESR1 (0.46) | ADRB2MAOBMAOACYP19A1CPN1 | |
| SCHEMBL30495002 | 0.91 | ADRB2 (0.48) | ADRB2MAOBMAOACYP19A1PNMT | |
| SCHEMBL310745 | 0.91 | ADRB2 (0.48) | ADRB2MAOBMAOACYP19A1PNMT | |
| SCHEMBL28087034 | 0.87 | CYP19A1 (0.52) | ADRB2MAOBMAOACYP19A1PNMT | |
| SCHEMBL30494859 | 0.84 | CYP19A1 (0.53) | ADRB2MAOBMAOACYP19A1PNMT | |
| Formamide SCHEMBL8865992 | 0.84 | MAOA (0.46) | ADRB2MAOBMAOACPN1CPB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100068650-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION | JSR CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |