SCHEMBL3260688

SCHEMBL3260688

CCOC(Cl)CCl.CCOCCBr

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL339818 0.80
SCHEMBL29732253 0.80
SCHEMBL57457 0.75
SCHEMBL3813470 0.72
SCHEMBL9171181 0.70 ALDH1A1 (0.43) ALDH1A1
SCHEMBL27400355 0.70 ALDH1A1 (0.43) ALDH1A1
SCHEMBL1782203 0.70
Ether SCHEMBL8961469 0.67 ALDH1A1 (0.38) ALDH1A1
Ethylene Glycol SCHEMBL3333475 0.66 ALDH1A1 (0.60) ALDH1A1
SCHEMBL14777872 0.64 THRB (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100068650-A1 POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION JSR CORPORATION (JP) 2010-03-18 US disclosed
EP-2131240-A1 POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION JSR Corporation (JP) 2009-12-09 EP disclosed