SCHEMBL3267863

SCHEMBL3267863

Clc1cccc2c1-c1ccccc1-2

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.47
LMNA P02545 2/20 0.47
CYP2A6 P11509 3/20 0.46
PDK2 Q15119 2/20 0.42
CYP1A2 P05177 2/20 0.41
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
TP53 P04637 1/20 0.39
HPGD P15428 1/20 0.39
ADORA2A P29274 1/20 0.39
DPP4 P27487 1/20 0.38
ALDH1A1 P00352 3/20 0.38
MAPK1 P28482 1/20 0.38
ATM Q13315 1/20 0.38
HSD17B10 Q99714 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
HSD11B1 P28845 1/20 0.37
IDO1 P14902 2/20 0.36
DNMT1 P26358 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5574276 1.00 TSHR (0.47) TSHRLMNACYP2A6PDK2CYP1A2
SCHEMBL9299768 1.00 TSHR (0.47) TSHRLMNACYP2A6PDK2CYP1A2
Iodide SCHEMBL28991660 0.97 TSHR (0.45) TSHRLMNACYP2A6PDK2CYP1A2
Hydrochloric Acid SCHEMBL29020357 0.97 TSHR (0.45) TSHRLMNACYP2A6PDK2CYP1A2
SCHEMBL7912309 0.80 PTPRC (0.59) LMNANPC1RAB9ASMN1; SMN2ADORA2A
SCHEMBL8668864 0.80 MEN1 (0.55) TSHRLMNANPC1RAB9ASMN1; SMN2
SCHEMBL8671883 0.80 ADORA2A (0.57) LMNACYP1A2NPC1RAB9ASMN1; SMN2
SCHEMBL2469822 0.80 CYP2A6 (0.55) TSHRLMNACYP2A6PDK2CYP1A2
SCHEMBL29236876 0.78 ALDH1A1 (0.47) TSHRLMNACYP1A2NPC1RAB9A
SCHEMBL1696361 0.77 CYP2A6 (0.65) TSHRLMNACYP2A6PDK2CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2031967-B1 USE OF MICROBIOLOGICAL CONSORTIA OF RHIZOSPHERE FOR POLLUTANTS ELIMINATION AND NITRATES REDUCTION IN AGRICULTURAL PRODUCTS CCS AOSTA S R L (IT) 2010-03-10 EP claimed
EP-0979809-B1 Process for the preparation of 4-chlorobiphenylenes CLARIANT GMBH (DE) 2003-01-29 EP claimed
EP-0979809-A1 Process for the preparation of 4-chlorobiphenylenes Clariant GmbH (DE) 2000-02-16 EP claimed
EP-0503831-B1 Destruction of polychlorinated biphenyls ONTARIO HYDRO (CA) 1997-09-17 EP claimed
EP-0625967-A1 N,N'-SUBSTITUTED IMIDOCARBONIMIDIC DIAMIDES DERIVED FROM HYDROXYLAMINES. JACOBUS PHARMA CO INC (US) 1994-11-30 EP claimed
WO-1993016037-A1 N,N'-SUBSTITUTED IMIDOCARBONIMIDIC DIAMIDES DERIVED FROM HYDROXYLAMINES JACOBUS PHARMACEUTICAL CO., INC. (US) 1993-08-19 WO claimed
US-4794871-A Method and installation for the treatment of material contaminated with toxic organic compounds ENVIRONMENT PROTECTION ENGINEERS, INC. (US) 1989-01-03 US claimed
EP-0257260-A1 Process for the hydrogenation treatment of mineral oils contaminated by chlorobiphenyls VEBA OEL Technologie und Automatisierung GmbH (DE) 1988-03-02 EP claimed
CN-102365133-B Compositions for multilayer coating and resins therefore SHERWIN WILLIAMS CO 2014-01-29 CN disclosed
CN-101815758-B Amine functional adducts and curable compositions comprising the same SHERWIN WILLIAMS CO 2013-07-31 CN disclosed
CN-102365133-A Compositions for multilayer coating and resins therefore SHERWIN WILLIAMS CO 2012-02-29 CN disclosed
CN-101980796-A Ambient cure painting method SHERWIN WILLIAMS CO 2011-02-23 CN disclosed
CN-101910230-A Epoxy resin composition containing isocyanurates for use in electrical laminates DOW GLOBAL TECHNOLOGIES INC 2010-12-08 CN disclosed
CN-101815758-A Amine functional adducts and curable compositions comprising the same SHERWIN WILLIAMS CO 2010-08-25 CN disclosed
EP-0170808-A1 Process for removing polychlorinated biphenyl (PCB) from electrically insulating fluids DIDIER-WERKE AG (DE) 1986-02-12 EP disclosed
US-4507465-A IMPACT STRENGTH TORAY INDUSTRIES, INC. (JP) 1985-03-26 US disclosed
EP-0113252-A2 Process for producing block copolyamide TORAY INDUSTRIES, INC. (JP) 1984-07-11 EP disclosed
EP-0070789-A2 Method of destroying compounds based on organic materials containing sulphur and/or halogens and/or toxic metals, and applications of said method CIRTA Centre International de Recherches et de Technologies Appliquées (FR) 1983-01-26 EP disclosed
EP-0008251-B1 DIELECTRIC LIQUIDS, MANUFACTURING PROCESS AND USES P C U K PRODUITS CHIMIQUES UGINE KUHLMANN (FR) 1982-02-17 EP disclosed
EP-0008251-A1 Dielectric liquids, manufacturing process and uses P C U K PRODUITS CHIMIQUES UGINE KUHLMANN (FR) 1980-02-20 EP disclosed