SCHEMBL3272242

SCHEMBL3272242

O=C(c1ccc(O)cc1)c1c(O)c(O)c(O)c(O)c1O

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.70
MAPT P10636 3/20 0.70
HTT P42858 2/20 0.70
HPGD P15428 2/20 0.70
ESR1 P03372 1/20 0.70
ESR2 Q92731 1/20 0.70
PKM P14618 1/20 0.70
SRD5A2 P31213 1/20 0.58
MAPK1 P28482 2/20 0.56
CA1 P00915 2/20 0.52
CA2 P00918 2/20 0.52
CA12 O43570 1/20 0.52
CA3 P07451 1/20 0.52
TYR P14679 1/20 0.52
DRD1 P21728 1/20 0.52
CA4 P22748 1/20 0.52
CA6 P23280 1/20 0.52
CA5A P35218 1/20 0.52
CA7 P43166 1/20 0.52
CA9 Q16790 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21935570 0.85 HTT (0.64) LMNAMAPTHTTHPGDESR1
SCHEMBL699850 0.83 LMNA (1.00) LMNAMAPTHTTHPGDESR1
SCHEMBL18423 0.83 LMNA (1.00) LMNAMAPTHTTHPGDESR1
SCHEMBL29056089 0.80 LMNA (0.94) LMNAMAPTHTTHPGDESR1
SCHEMBL7929114 0.80 LMNA (0.94) LMNAMAPTHTTHPGDESR1
Methane SCHEMBL6378712 0.80 LMNA (0.94) LMNAMAPTHTTHPGDESR1
Fluoride SCHEMBL16505425 0.80 LMNA (0.94) LMNAMAPTHTTHPGDESR1
SCHEMBL1064484 0.79 ALDH1A1 (0.65) LMNAMAPTSRD5A2RAB9AMEN1
SCHEMBL8441855 0.79 LMNA (0.70) LMNAMAPTHTTHPGDESR1
SCHEMBL9187267 0.78 LMNA (0.61) LMNAMAPTHTTHPGDESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10894887-B2 Composition for forming film protecting against aqueous hydrogen peroxide solution NISSAN CHEMICAL CORPORATION (JP) 2021-01-19 US disclosed
US-20200131376-A1 COMPOSITION FOR FORMING FILM PROTECTING AGAINST AQUEOUS HYDROGEN PEROXIDE SOLUTION NISSAN CHEMICAL CORPORATION (JP) 2020-04-30 US disclosed
US-7691915-B2 Photosensitive resin composition for forming organic insulating film and device using the same CHEIL INDUSTRIES INC. (KR) 2010-04-06 US disclosed
US-20080145786-A1 Photosensitive Resin Composition for Forming Organic Insulating Film and Device Using the Same CHEIL INDUSTRIES INC. (KR) 2008-06-19 US disclosed