SCHEMBL3280966

SCHEMBL3280966

C=C(C)C(=O)OCCNCC(C)C

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.53
SCN1A P35498 1/20 0.49
SCN2A Q99250 1/20 0.49
SCN3A Q9NY46 1/20 0.49
THRB P10828 1/20 0.46
ALDH1A1 P00352 3/20 0.39
POLB P06746 1/20 0.35
APEX1 P27695 1/20 0.35
HTT P42858 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
ANPEP P15144 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
CA12 O43570 1/20 0.30
CA7 P43166 1/20 0.30
CA9 Q16790 1/20 0.30
CA14 Q9ULX7 1/20 0.30
KDM4E B2RXH2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL28737206 0.98 TSHR (0.52) TSHRSCN1ASCN2ASCN3ATHRB
SCHEMBL28361317 0.91 TSHR (0.45) TSHRSCN1ASCN2ASCN3ATHRB
SCHEMBL3281660 0.90 TSHR (0.50) TSHRSCN1ASCN2ASCN3ATHRB
SCHEMBL20872418 0.88 TSHR (0.47) TSHRSCN1ASCN2ASCN3ATHRB
SCHEMBL7181447 0.86 THRB (0.46) TSHRSCN1ASCN2ASCN3ATHRB
SCHEMBL1997757 0.85 THRB (0.46) TSHRSCN1ASCN2ASCN3ATHRB
SCHEMBL9321905 0.85 THRB (0.55) TSHRSCN1ASCN2ASCN3ATHRB
SCHEMBL9683187 0.84 THRB (0.44) TSHRSCN1ASCN2ASCN3ATHRB
SCHEMBL11135459 0.84 TSHR (0.52) TSHRSCN1ASCN2ASCN3ATHRB
SCHEMBL13950019 0.83 THRB (0.53) TSHRSCN1ASCN2ASCN3ATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2017027428-A1 CLEANING COMPOSITION AND METHOD OF USE GEORGIA-PACIFIC CONSUMER PRODUCTS LP (US) 2017-02-16 WO claimed
US-20060181587-A1 Ink set and media for ink-jet printing HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2006-08-17 US claimed
CN-110007563-B Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element 奇美实业股份有限公司 2024-04-02 CN disclosed
CN-109062007-B Positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2023-03-10 CN disclosed
CN-107885034-B Negative white photosensitive resin composition and application thereof 奇美实业股份有限公司 2023-03-07 CN disclosed
CN-115542666-A Photosensitive resin composition for spacer and protective film 奇美实业股份有限公司 2022-12-30 CN disclosed
CN-108693710-B Positive photosensitive polysiloxane composition 奇美实业股份有限公司 2022-12-02 CN disclosed
CN-107544208-B Negative photosensitive resin composition, spacer, protective film and liquid crystal display element 奇美实业股份有限公司 2022-05-31 CN disclosed
CN-107179652-B Positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2022-02-08 CN disclosed
CN-106200264-B White photosensitive resin composition, white matrix, color filter, reflective display device, white frame and display device 奇美实业股份有限公司 2021-02-26 CN disclosed
CN-106189469-B Aqueous coating composition having low or zero VOC and comprising encapsulated or polymer adsorbed pigment and reduced binder 罗门哈斯公司 2020-10-30 CN disclosed
EP-0988152-A1 COATING COMPOSITION AND PRINTING MEDIUM PPG Industries Ohio, Inc. (US) 2000-03-29 EP disclosed
US-5880196-A VOLATILE AQUEOUS LIQUID MEDIUM CONTAINING ONIUM-FREE AND ONIUM-CONTAINING POLYMERIC BINDERS, FINELY DIVIDED PSEUDOBOEHMITE PARTICLES; NONBLEEDING PPG INDUSTRIES, INC. (US) 1999-03-09 US disclosed
WO-1998056592-A1 COATING COMPOSITION AND PRINTING MEDIUM PPG INDUSTRIES OHIO, INC. (US) 1998-12-17 WO disclosed
WO-1998056591-A1 COATING COMPOSITION AND PRINTING MEDIUM PPG INDUSTRIES OHIO, INC. (US) 1998-12-17 WO disclosed
US-4559389-A HIGH RESOLUTION AND DRY ETCHING RESISTANCE ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1985-12-17 US disclosed
US-4523000-A HIGH RESOLUTION, AND DRY ETCH RESISTANCE, SOLVENT SOLUBLE ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1985-06-11 US disclosed
US-4163092-A QUATERNIZED MONOMER, CROSS-LINKING AGENT PLASTOMEDICAL SCIENCES, INC. (US) 1979-07-31 US disclosed
US-4060678-A Cationic hydrogels based on hydroxyalkyl acrylates and methacrylates PLASTOMEDICAL SCIENCES, INC. (US) 1977-11-29 US disclosed
US-4058491-A Cationic hydrogels based on heterocyclic N-vinyl monomers PLASTOMEDICAL SCIENCES, INC. (US) 1977-11-15 US disclosed