SCHEMBL3284972

SCHEMBL3284972

Fc1ccc([I+]c2ccc(F)cc2)cc1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
CA2 P00918 19/20 0.39
CA1 P00915 18/20 0.37
MMP1 P03956 2/20 0.37
MMP2 P08253 2/20 0.37
MMP9 P14780 2/20 0.37
MMP8 P22894 2/20 0.37
MMP13 P45452 2/20 0.37
HSD11B1 P28845 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1801410 0.98 CA2 (0.36) CA2CA1MMP1MMP2MMP9
SCHEMBL3284031 0.94 CA2 (0.35) CA2CA1MMP1MMP2MMP9
SCHEMBL1805421 0.92 CA2 (0.34) CA2CA1MMP1MMP2MMP9
SCHEMBL4219795 0.91 ACHE (0.37) CA2CA1HSD11B1
Toliodium SCHEMBL2897584 0.86 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL548235 0.86 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL1804475 0.86 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL59303 0.85 CA2 (0.40) CA2CA1MMP1MMP2MMP9
SCHEMBL213386 0.85 CA2 (0.40) CA2CA1MMP1MMP2MMP9
Toliodium SCHEMBL2895493 0.84 TLR9 (0.39) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7705115-B2 Process for producing radiation-sensitive resin composition JSR CORPORATION (JP) 2010-04-27 US disclosed
US-20090081586-A1 PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-03-26 US disclosed
EP-1881371-A1 PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-01-23 EP disclosed