SCHEMBL3285404

SCHEMBL3285404

CCCCC(C)(OCC)C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.35
PAM P19021 2/20 0.33
TSHR P16473 2/20 0.33
AKR1B1 P15121 1/20 0.33
TP53 P04637 1/20 0.33
HCAR2 Q8TDS4 1/20 0.33
ATM Q13315 1/20 0.33
CA2 P00918 1/20 0.33
MAPK1 P28482 1/20 0.33
PLA2G4B P0C869 1/20 0.33
FDPS P14324 1/20 0.32
SLC22A6 Q4U2R8 1/20 0.32
SLC22A8 Q8TCC7 1/20 0.32
GPR84 Q9NQS5 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL165416 0.92 MEN1 (0.40) ALDH1A1TSHRATMSLC22A6SLC22A8
SCHEMBL3294522 0.92 MEN1 (0.40) ALDH1A1TSHRATMSLC22A6SLC22A8
SCHEMBL9335557 0.92 MEN1 (0.40) ALDH1A1TSHRATMSLC22A6SLC22A8
SCHEMBL3284825 0.88 ALDH1A1 (0.40) ALDH1A1TSHRTP53HCAR2ATM
SCHEMBL3286085 0.87 LMNA (0.36) ALDH1A1TSHR
SCHEMBL12244867 0.86 ALDH1A1 (0.34) ALDH1A1PAMTSHRAKR1B1TP53
SCHEMBL17023984 0.84 TP53 (0.42) ALDH1A1TSHRTP53HCAR2PLA2G4B
SCHEMBL17023982 0.84 TP53 (0.42) ALDH1A1TSHRTP53HCAR2PLA2G4B
SCHEMBL9423044 0.83 ALDH1A1 (0.38) ALDH1A1PAMTSHRAKR1B1TP53
SCHEMBL3287748 0.82 ALDH1A1 (0.39) ALDH1A1TSHRTP53HCAR2ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101236356-B Photoresist composition, thin film patterning method using the same, and method of fabricating liquid crystal display using the same SAMSUNG ELECTRONICS CO LTD 2012-11-21 CN disclosed
US-7713677-B2 Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-05-11 US disclosed
CN-101236356-A Photoresist composition, thin film patterning method using the same, and method of fabricating liquid crystal display using the same SAMSUNG ELECTRONICS CO LTD (KR) 2008-08-06 CN disclosed
US-20070190454-A1 PHOTORESIST COMPOSITION, METHOD OF PATTERNING THIN FILM USING THE SAME, AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY PANEL USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-08-16 US disclosed