SCHEMBL3286085

SCHEMBL3286085

CCCC(C)(OCC)C(=O)O

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.36
HSD17B10 Q99714 1/20 0.36
ALDH1A1 P00352 3/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
ELANE P08246 1/20 0.33
CYP1A2 P05177 1/20 0.33
THRB P10828 1/20 0.33
GAA P10253 1/20 0.32
TSHR P16473 2/20 0.32
KDM4C Q9H3R0 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31
HIF1A Q16665 1/20 0.31
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3285404 0.87 ALDH1A1 (0.35) ALDH1A1TSHR
SCHEMBL9335557 0.84 MEN1 (0.40) HSD17B10ALDH1A1MEN1KMT2ATSHR
SCHEMBL3294522 0.84 MEN1 (0.40) HSD17B10ALDH1A1MEN1KMT2ATSHR
SCHEMBL165416 0.84 MEN1 (0.40) HSD17B10ALDH1A1MEN1KMT2ATSHR
SCHEMBL7351412 0.81 ADORA3 (0.37) LMNAHSD17B10ALDH1A1MEN1KMT2A
SCHEMBL249765 0.81 ADORA3 (0.37) LMNAHSD17B10ALDH1A1MEN1KMT2A
SCHEMBL13412398 0.81 ALDH1A1 (0.38) ALDH1A1MEN1KMT2ACYP1A2THRB
SCHEMBL29815587 0.81 LMNA (0.33) LMNAHSD17B10ALDH1A1MEN1KMT2A
SCHEMBL3287748 0.81 ALDH1A1 (0.39) ALDH1A1ELANETSHR
SCHEMBL7031959 0.79 LMNA (0.38) LMNAHSD17B10ALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025018855-A1 INK-REPELLENT COMPOUND AND PHOTOSENSITIVE COMPOSITION CONTAINING SAME 덕산네오룩스 주식회사 2025-01-23 WO disclosed
WO-2025009942-A1 METHOD FOR MANUFACTURING PATTERN FROM PHOTOSENSITIVE COMPOSITION 덕산네오룩스 주식회사 2025-01-09 WO disclosed
WO-2025009700-A1 CURABLE COMPOSITION, CURED LAYER USING SAME, AND DISPLAY DEVICE 삼성에스디아이 주식회사 2025-01-09 WO disclosed
WO-2024232614-A1 RESIN, RESIN COMPOSITION, AND DISPLAY DEVICE USING SAME 덕산네오룩스 주식회사 2024-11-14 WO disclosed
CN-118915387-A Resin, resin composition, and display device using same 德山新勒克斯有限公司 2024-11-08 CN disclosed
WO-2024219866-A1 PHOTOSENSITIVE COMPOSITION COMPRISING REACTIVE DYE 덕산네오룩스 주식회사 2024-10-24 WO disclosed
WO-2024215187-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM PREPARED USING SAME, AND COLOR FILTER 삼성에스디아이 주식회사 2024-10-17 WO disclosed
CN-118778358-A Photosensitive resin composition, photosensitive resin layer, color filter and image sensor 三星SDI株式会社 2024-10-15 CN disclosed
WO-2024205364-A1 METHOD FOR MANUFACTURING PIXEL DEFINITION LAYER 덕산네오룩스 주식회사 2024-10-03 WO disclosed
WO-2024205343-A2 METHOD FOR MANUFACTURING PIXEL DEFINITION LAYER 덕산네오룩스 주식회사 2024-10-03 WO disclosed
CN-111247484-B Photosensitive resin composition having improved adhesion or adhesiveness and light-shielding layer using the same 德山新勒克斯有限公司 2024-01-09 CN disclosed
CN-116909096-A Photosensitive composition for forming light shielding layer of organic light emitting display device 德山新勒克斯有限公司 2023-10-20 CN disclosed
CN-116670589-A Resin, resin composition, and display device using same 德山新勒克斯有限公司 2023-08-29 CN disclosed
CN-115997168-A Photosensitive resin composition with low reflectivity and light shielding layer using same 德山新勒克斯有限公司 2023-04-21 CN disclosed
US-7713677-B2 Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-05-11 US disclosed
US-7579124-B2 Pyrazolotriazole ring containing dye for improving heat resistance and photostability, curable monomers, alkali soluble ibinders, photosensitive azide compound, a crosslinking agent FUJIFILM CORPORATION (JP) 2009-08-25 US disclosed
US-20080048181-A1 Organic Semiconductor Thin Film, Organic Semiconductor Device, Organic Thin Film Transistor and Organic Electronic Luminescence Element KONICA MINOLTA HOLDINGS, INC. (JP) 2008-02-28 US disclosed
US-20070190454-A1 PHOTORESIST COMPOSITION, METHOD OF PATTERNING THIN FILM USING THE SAME, AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY PANEL USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-08-16 US disclosed
EP-1758172-A1 ORGANIC SEMICONDUCTOR THIN FILM, ORGANIC SEMICONDUCTOR DEVICE, ORGANIC THIN FILM TRANSISTOR, AND ORGANIC ELECTRO-LUMINESCENCE ELEMENT KONICA MINOLTA HOLDINGS, INC. (JP) 2007-02-28 EP disclosed
WO-2006011647-A1 POLYMERIZABLE COMPOSITION, OPTICALLY ANISOTROPIC LAYER AND METHOD FOR MANUFACTURING THEREOF, OPTICAL COMPENSATORY ELEMENT, LIQUID CRYSTAL DISPLAY AND LIQUID CRYSTAL PROJECTOR FUJIFILM CORPORATION (JP) 2006-02-02 WO disclosed