SCHEMBL3285462

SCHEMBL3285462

O=C(O)CC(C(=O)O)C(C(=O)O)C(CC(=O)O)C(=O)O

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.72
SMN1; SMN2 Q16637 1/20 0.46
SLC22A6 Q4U2R8 1/20 0.43
FOLH1 Q04609 2/20 0.39
GABRR1 P24046 2/20 0.36
LMNA P02545 1/20 0.36
TSHR P16473 1/20 0.35
CPA1 P15085 2/20 0.32
CPB1 P15086 1/20 0.32
CPA3 P15088 1/20 0.32
CPB2 Q96IY4 1/20 0.32
MAPT P10636 1/20 0.32
SLC1A3 P43003 1/20 0.31
SLC1A2 P43004 1/20 0.31
SLC1A1 P43005 1/20 0.31
CPT2 P23786 1/20 0.31
ACLY P53396 1/20 0.31
KDM4A O75164 1/20 0.31
TET2 Q6N021 1/20 0.31
KDM4C Q9H3R0 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL786389 0.94 TDP1 (0.72) TDP1SMN1; SMN2SLC22A6FOLH1GABRR1
SCHEMBL25414620 0.92 TDP1 (0.68) TDP1SMN1; SMN2SLC22A6FOLH1GABRR1
SCHEMBL3161392 0.88 TDP1 (0.56) TDP1SMN1; SMN2SLC22A6FOLH1
SCHEMBL28060338 0.87 TDP1 (0.62) TDP1SMN1; SMN2SLC22A6FOLH1GABRR1
SCHEMBL165643 0.84 TDP1 (1.00) TDP1SMN1; SMN2SLC22A6FOLH1GABRR1
SCHEMBL17517216 0.84 TDP1 (1.00) TDP1SMN1; SMN2SLC22A6FOLH1GABRR1
SCHEMBL22151 0.84 TDP1 (1.00) TDP1SMN1; SMN2SLC22A6FOLH1GABRR1
SCHEMBL16925719 0.84 TDP1 (1.00) TDP1SMN1; SMN2SLC22A6FOLH1GABRR1
SCHEMBL259232 0.83 TDP1 (0.56) TDP1SMN1; SMN2SLC22A6FOLH1SLC1A3
Mellitic Acid SCHEMBL8009331 0.83 TDP1 (0.56) TDP1SMN1; SMN2SLC22A6FOLH1GABRR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11905491-B2 Post CMP cleaning compositions ENTEGRIS, INC. (US) 2024-02-20 US claimed
EP-4225882-A1 POST CMP CLEANING COMPOSITIONS Entegris, Inc. (US) 2023-08-16 EP claimed
CN-116457447-A POST chemical mechanical polishing (POST CMP) cleaning compositions 恩特格里斯公司 2023-07-18 CN claimed
WO-2022076265-A1 POST CMP CLEANING COMPOSITIONS ENTEGRIS, INC. (US) 2022-04-14 WO claimed
EP-2812422-B1 A POST CHEMICAL-MECHANICAL-POLISHING (POST-CMP) CLEANING COMPOSITION COMPRISING A SPECIFIC SULFUR-CONTAINING COMPOUND AND A SUGAR ALCOHOL BASF SE (DE) 2019-08-07 EP claimed
CN-104093824-B Cleaning combination after chemically mechanical polishing comprising specific sulfur-containing compound and sugar alcohol or polybasic carboxylic acid 巴斯夫欧洲公司 2018-05-11 CN claimed
US-9458415-B2 Post chemical-mechanical-polishing (post-CMP) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid BASF SE (DE) 2016-10-04 US claimed
US-9275851-B2 Aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devices BASF SE (DE) 2016-03-01 US claimed
EP-2812422-A1 A POST CHEMICAL-MECHANICAL-POLISHING (POST-CMP) CLEANING COMPOSITION COMPRISING A SPECIFIC SULFUR-CONTAINING COMPOUND AND A SUGAR ALCOHOL OR A POLYCARBOXYLIC ACID BASF SE (DE) 2014-12-17 EP claimed
CN-104093824-A A post chemical-mechanical-polishing (post-cmp) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid BASF SE 2014-10-08 CN claimed
EP-2688688-A1 AQUEOUS, NITROGEN-FREE CLEANING COMPOSITION, PREPARATION AND USE THEREOF BASF SE (DE) 2014-01-29 EP claimed
WO-2013118042-A1 A POST CHEMICAL-MECHANICAL-POLISHING (POST-CMP) CLEANING COMPOSITION COMPRISING A SPECIFIC SULFUR-CONTAINING COMPOUND AND COMPRISING NO SIGNIFICANT AMOUNTS OF SPECIFIC NITROGEN-CONTAINING COMPOUNDS BASF SE (DE) 2013-08-15 WO claimed
WO-2013118013-A1 A POST CHEMICAL-MECHANICAL-POLISHING (POST-CMP) CLEANING COMPOSITION COMPRISING A SPECIFIC SULFUR-CONTAINING COMPOUND AND A SUGAR ALCOHOL OR A POLYCARBOXYLIC ACID BASF SE (DE) 2013-08-15 WO claimed
WO-2012127336-A1 AQUEOUS, NITROGEN-FREE CLEANING COMPOSITION, PREPARATION AND USE THEREOF BASF SE (DE) 2012-09-27 WO claimed
WO-2026104570-A1 LIPOSOMAL SUSPENSION AND SYSTEM AND METHOD OF PERITONEAL ADMINISTRATION OF LIPOSOMAL SUSPENSION GENFIT (FR) 2026-05-21 WO disclosed
US-12528916-B2 Transmembrane pH-gradient polymersomes ETH ZURICH (CH) 2026-01-20 US disclosed
US-20250339393-A1 USE OF TRANSMEMBRANE PH GRADIENT LIPOSOMES FOR TREATING HYPERAMMONEMIC CRISIS ASSOCIATED WITH INBORN ERRORS OF METABOLISM GENFIT (FR) 2025-11-06 US disclosed
WO-1984004524-A1 BIS-PLATINUM COMPLEXES AS ANTITUMOR AGENTS ANDRULIS RES CORP (US) 1984-11-22 WO disclosed
US-4219665-A Polycarboxylic acid-2-hydroxylalkyl esters, their use as emulsifying agents and cosmetic emulsions containing them HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (HENKEL KGAA) (DE) 1980-08-26 US disclosed
US-4143160-A COSMETIC CONTAINING POLYCARBOXYLIC ACIDS HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 1979-03-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12528916-B2 Transmembrane pH-gradient polymersomes AQP4, ABCB11, SLC6A6 TDP1 1448/4885SMN1; SMN2 562/4885SLC22A6 85/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.