Urea

Urea

SCHEMBL329207

C=CN.NC(N)=O

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Carbamic Acid SCHEMBL1422615 0.87
Acetamide SCHEMBL28275765 0.84
Acrylamide SCHEMBL1921274 0.84
Butadiene SCHEMBL6920375 0.82
Urea SCHEMBL375922 0.82
Bicarbonate SCHEMBL4624573 0.82
Bicarbonate SCHEMBL4624568 0.82 LMNA (0.50)
Acrylamide SCHEMBL65056 0.78
Urea SCHEMBL6896912 0.78 ALDH1A1 (0.53)
Urea SCHEMBL4969063 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12018173-B1 High physical durability coating compositions SWIMC LLC (US) 2024-06-25 US disclosed
CN-108831830-B Abrasive, abrasive set, and method for polishing substrate 株式会社力森诺科 2024-05-17 CN disclosed
US-11905434-B2 Water-based compositions with long term gloss retention SWIMC LLC (US) 2024-02-20 US disclosed
US-20230399535-A1 RHEOLOGICAL METHODS FOR HIGH BLOCK, TACK AND SCRUB RESISTANT COATING COMPOSITION SWIMC LLC (US) 2023-12-14 US disclosed
CN-107949615-B Polishing liquid, polishing liquid set and method for polishing substrate 株式会社力森诺科 2023-08-04 CN disclosed
US-11649368-B2 Rheological methods for high block, tack and scrub resistant coating composition SWIMC LLC (US) 2023-05-16 US disclosed
US-20230075015-A1 LATEX POLYMER WITH IMPROVED WASHABILITY AND BLOCK RESISTANCE SWIMC LLC (US) 2023-03-09 US disclosed
US-20220056300-A1 RHEOLOGICAL METHODS FOR HIGH BLOCK, TACK AND SCRUB RESISTANT COATING COMPOSITION SWIMC LLC (US) 2022-02-24 US disclosed
US-11168230-B2 High block, tack and scrub resistant coating composition SWIMC LLC (US) 2021-11-09 US disclosed
US-11136468-B2 Rheological methods for high block, tack and scrub resistant coating composition SWIMC LLC (US) 2021-10-05 US disclosed
CN-104736685-A Lubricating composition comprising an esterified copolymer and a diene rubber copolymer LUBRIZOL CORP 2015-06-24 CN disclosed
CN-104582899-A Polishing agent, polishing agent kit, and method for polishing substrate HITACHI CHEMICAL CO LTD 2015-04-29 CN disclosed
CN-104137232-A Polishing agent, polishing agent set, and method for polishing substrate HITACHI CHEMICAL CO LTD 2014-11-05 CN disclosed
EP-2791261-A1 HIGH BLOCK, TACK AND SCRUB RESISTANT COATING COMPOSITION Valspar Sourcing, Inc. (US) 2014-10-22 EP disclosed
US-20140256868-A1 HIGH BLOCK, TACK AND SCRUB RESISTANT POLYMER VALSPAR SOURCING, INC. (US) 2014-09-11 US disclosed
US-20130247984-A1 MULTILAYER FILM AND PHOTOVOLTAIC MODULE INCLUDING THE SAME LG CHEM, LTD. (KR) 2013-09-26 US disclosed
EP-2639060-A2 MULTILAYER FILM, AND PHOTOVOLTAIC MODULE COMPRISING SAME LG Chem, Ltd. (KR) 2013-09-18 EP disclosed
WO-2013090341-A1 HIGH BLOCK, TACK AND SCRUB RESISTANT COATING COMPOSITION VALSPAR SOURCING, INC. (US) 2013-06-20 WO disclosed
EP-2405997-A2 VINYL POLYMER WETTING AND DISPERSING AGENTS Valspar Sourcing, Inc. (US) 2012-01-18 EP disclosed
WO-2010105219-A2 VINYL POLYMER WETTING AND DISPERSING AGENTS VALSPAR SOURCING, INC. (US) 2010-09-16 WO disclosed