Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 3/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.42 |
| ▸ | CA5A | P35218 | 1/20 | 0.40 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.40 |
| ▸ | CA4 | P22748 | 1/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | BCAT2 | O15382 | 1/20 | 0.35 |
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.34 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.33 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL329176 | 0.83 | LTA4H (0.43) | LTA4HTSHRKCNA3CA5ACA5B | |
| SCHEMBL431273 | 0.79 | CA4 (0.42) | LTA4HTSHRKCNA3CA5ACA5B | |
| SCHEMBL706489 | 0.79 | KCNA3 (0.44) | LTA4HTSHRKCNA3CA5ACA5B | |
| SCHEMBL6696698 | 0.79 | TAAR1 (0.44) | LTA4HTSHRKCNA3CA5ACA5B | |
| SCHEMBL329378 | 0.79 | KCNA3 (0.44) | LTA4HTSHRKCNA3CA5ACA5B | |
| SCHEMBL3915000 | 0.79 | LTA4H (0.39) | LTA4HTSHRKCNA3CA5ACA5B | |
| SCHEMBL3916371 | 0.79 | LTA4H (0.39) | LTA4HTSHRKCNA3CA5ACA5B | |
| SCHEMBL9323575 | 0.79 | HDAC3 (0.40) | LTA4HTSHRKCNA3CA5ACA5B | |
| SCHEMBL19205509 | 0.77 | LTA4H (0.38) | LTA4HTSHRKCNA3CA5ACA5B | |
| SCHEMBL3338614 | 0.77 | TSHR (0.39) | LTA4HTSHRKCNA3CA5ACA5B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11781037-B2 | High-durability antifogging coating film and coating composition | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-10-10 | — | — | US | disclosed |
| CN-111684030-B | High-durability antifogging coating film and coating composition | 旭化成株式会社 | 2022-11-01 | — | — | CN | disclosed |
| CN-108699392-B | High-durability antifogging coating film and coating composition | 旭化成株式会社 | 2021-11-23 | — | — | CN | disclosed |
| US-11041076-B2 | Highly durable antifogging coating film and coating composition | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2021-06-22 | — | — | US | disclosed |
| US-20210079256-A1 | HIGH-DURABILITY ANTIFOGGING COATING FILM AND COATING COMPOSITION | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2021-03-18 | — | — | US | disclosed |
| EP-3431561-B1 | HIGHLY DURABLE ANTIFOGGING COATING FILM AND COATING COMPOSITION | ASAHI CHEMICAL IND (JP) | 2020-12-30 | — | — | EP | disclosed |
| EP-3757181-A1 | HIGH-DURABILITY ANTIFOGGING COATING FILM AND COATING COMPOSITION | Asahi Kasei Kabushiki Kaisha (JP) | 2020-12-30 | — | — | EP | disclosed |
| CN-111684030-A | High-durability antifogging coating film and coating composition | 旭化成株式会社 | 2020-09-18 | — | — | CN | disclosed |
| US-10474032-B2 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-12 | — | — | US | disclosed |
| WO-2019163918-A1 | HIGH-DURABILITY ANTIFOGGING COATING FILM AND COATING COMPOSITION | 旭化成株式会社 | 2019-08-29 | — | — | WO | disclosed |
| EP-1561841-A2 | Cleaning CVD Chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-08-10 | — | — | EP | disclosed |
| CN-1651159-A | Cleaning CVD chambers following deposition of porogen-containing materials | AIR PROD & CHEM (US) | 2005-08-10 | — | — | CN | disclosed |
| US-20050161060-A1 | Cleaning CVD chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. | 2005-07-28 | — | — | US | disclosed |
| US-20050089642-A1 | Dielectric materials preparation | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) | 2005-04-28 | — | — | US | disclosed |
| US-6787191-B2 | Coating composition for the production of insulating thin films | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-09-07 | — | — | US | disclosed |
| US-20040109950-A1 | Dielectric materials | SHIPLEY COMPANY, L.L.C. | 2004-06-10 | — | — | US | disclosed |
| US-20040077757-A1 | Coating composition for use in producing an insulating thin film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-04-22 | — | — | US | disclosed |
| US-20040048960-A1 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. | 2004-03-11 | — | — | US | disclosed |
| EP-1376671-A1 | Compositions for preparing materials with a low dielectric constant | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-01-02 | — | — | EP | disclosed |
| US-20030099844-A1 | Coating composition for the production of insulating thin films | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2003-05-29 | — | — | US | disclosed |