SCHEMBL329176

SCHEMBL329176

c1ccc(O[Si](CC[Si](Oc2ccccc2)(Oc2ccccc2)Oc2ccccc2)(Oc2ccccc2)Oc2ccccc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 4/20 0.43
TSHR P16473 1/20 0.43
KCNA3 P22001 1/20 0.42
CA5A P35218 1/20 0.40
CA5B Q9Y2D0 1/20 0.40
CA4 P22748 1/20 0.39
KCNH2 Q12809 1/20 0.38
TAAR1 Q96RJ0 1/20 0.37
ALDH1A1 P00352 1/20 0.37
RECQL P46063 1/20 0.37
ALOX15 P16050 1/20 0.36
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
HDAC3 O15379 1/20 0.33
HDAC4 P56524 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC7 Q8WUI4 1/20 0.33
HDAC2 Q92769 1/20 0.33
HDAC10 Q969S8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL706489 0.90 KCNA3 (0.44) LTA4HTSHRKCNA3CA5ACA5B
SCHEMBL329378 0.90 KCNA3 (0.44) LTA4HTSHRKCNA3CA5ACA5B
SCHEMBL11782979 0.85 HDAC3 (0.42) LTA4HTSHRKCNA3CA5ACA5B
SCHEMBL6698560 0.85 TAAR1 (0.46) LTA4HTSHRKCNA3CA5ACA5B
SCHEMBL11266061 0.85 KCNH2 (0.38) LTA4HTSHRKCNA3CA5ACA5B
SCHEMBL423709 0.85 LTA4H (0.41) LTA4HTSHRKCNA3CA5ACA5B
SCHEMBL329329 0.83 LTA4H (0.43) LTA4HTSHRKCNA3CA5ACA5B
SCHEMBL3357482 0.82 HDAC3 (0.48) LTA4HTSHRKCNA3CA5ACA5B
SCHEMBL305461 0.82 TAAR1 (0.43) LTA4HKCNA3TAAR1
SCHEMBL3923803 0.82 KCNA3 (0.43) LTA4HTSHRKCNA3KCNH2TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260132309-A1 HARD COATING FILM, HARD COATING FILM-APPLIED SUBSTRATE, COATING MATERIAL COMPOSITION, AND WINDOW MATERIAL ASAHI KASEI KABUSHIKI KAISHA (JP) 2026-05-14 US disclosed
US-12545808-B2 Hard coating film, hard coating film-applied substrate, coating material composition, and window material ASAHI KASEI KABUSHIKI KAISHA (JP) 2026-02-10 US disclosed
US-20240376323-A1 ADHESION LAYER-APPLIED SUBSTRATE, LAMINATE, AND COATING MATERIAL COMPOSITION ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-11-14 US disclosed
CN-118909504-A Coating composition 旭化成株式会社 2024-11-08 CN disclosed
CN-115175807-B Laminate, hard coat film, and coating composition 旭化成株式会社 2024-09-10 CN disclosed
CN-117836138-A Substrate with adhesive layer, laminate, and coating composition 旭化成株式会社 2024-04-05 CN disclosed
US-11781037-B2 High-durability antifogging coating film and coating composition ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-10-10 US disclosed
US-20230086403-A1 LAMINATE, HARD COATING FILM, AND COATING MATERIAL COMPOSITION ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-03-23 US disclosed
WO-2023038123-A1 ADHESIVE-LAYER-EQUIPPED SUBSTRATE, LAMINATE, AND COATING COMPOSITION 旭化成株式会社 2023-03-16 WO disclosed
EP-4116085-A1 LAMINATE, HARD-COAT COATING FILM, AND COATING MATERIAL COMPOSITION Asahi Kasei Kabushiki Kaisha (JP) 2023-01-11 EP disclosed
US-20050196974-A1 Compositions for preparing low dielectric materials containing solvents VERSUM MATERIALS US, LLC 2005-09-08 US disclosed
EP-1561841-A2 Cleaning CVD Chambers following deposition of porogen-containing materials AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-08-10 EP disclosed
US-20050161060-A1 Cleaning CVD chambers following deposition of porogen-containing materials AIR PRODUCTS AND CHEMICALS, INC. 2005-07-28 US disclosed
US-20050089642-A1 Dielectric materials preparation ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) 2005-04-28 US disclosed
US-6787191-B2 Coating composition for the production of insulating thin films ASAHI KASEI KABUSHIKI KAISHA (JP) 2004-09-07 US disclosed
US-20040109950-A1 Dielectric materials SHIPLEY COMPANY, L.L.C. 2004-06-10 US disclosed
US-20040077757-A1 Coating composition for use in producing an insulating thin film ASAHI KASEI KABUSHIKI KAISHA (JP) 2004-04-22 US disclosed
US-20040048960-A1 Compositions for preparing low dielectric materials AIR PRODUCTS AND CHEMICALS, INC. 2004-03-11 US disclosed
EP-1376671-A1 Compositions for preparing materials with a low dielectric constant AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-01-02 EP disclosed
US-20030099844-A1 Coating composition for the production of insulating thin films ASAHI KASEI KABUSHIKI KAISHA (JP) 2003-05-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12545808-B2 Hard coating film, hard coating film-applied substrate, coating material composition, and window material COL14A1, CD69, COL2A1 LTA4H 1423/4885TSHR 4057/4885KCNA3 3631/4885
US-20260132309-A1 HARD COATING FILM, HARD COATING FILM-APPLIED SUBSTRATE, COATING MATERIAL COMPOSITION, AND WINDOW MATERIAL SMARCA4, H1-10, SMARCA1 LTA4H 1881/4885TSHR 3311/4885KCNA3 3319/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.