Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.48 |
| ▸ | CA2 | P00918 | 3/20 | 0.48 |
| ▸ | CA7 | P43166 | 2/20 | 0.48 |
| ▸ | CA9 | Q16790 | 2/20 | 0.48 |
| ▸ | CA12 | O43570 | 1/20 | 0.48 |
| ▸ | CA4 | P22748 | 1/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.48 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.40 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | DRD2 | P14416 | 1/20 | 0.40 |
| ▸ | DRD3 | P35462 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 2/20 | 0.39 |
| ▸ | HTR1A | P08908 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28297298 | 0.80 | CA1 (0.56) | CA1CA2CA7CA9CA12 | |
| 1,2-Dimethoxybenzene SCHEMBL15206586 | 0.78 | CA1 (0.65) | CA1CA2CA7CA9CA12 | |
| SCHEMBL18784862 | 0.75 | LTA4H (0.47) | CA4DRD2DRD3ALDH1A1MAPK1 | |
| 1-Methoxy-2-Butoxybenzene SCHEMBL31085542 | 0.72 | L3MBTL1 (0.63) | CA1CA2CA7CA9CA12 | |
| 1-Methoxy-2-Butoxybenzene SCHEMBL364856 | 0.72 | L3MBTL1 (0.63) | CA1CA2CA7CA9CA12 | |
| 1,2-Dimethoxybenzene SCHEMBL22800426 | 0.72 | CA1 (0.56) | CA1CA2CA7CA9CA12 | |
| 1,2-Dimethoxybenzene SCHEMBL27576916 | 0.72 | CA1 (0.81) | CA1CA2CA7CA9CA12 | |
| SCHEMBL10627370 | 0.72 | ALDH1A1 (0.47) | L3MBTL1TDP1ALDH1A1MAPK1HTT | |
| SCHEMBL28297332 | 0.72 | CA12 (0.50) | CA1CA2CA7CA9CA12 | |
| 1-Methoxy-2-Pentoxybenzene SCHEMBL15086389 | 0.71 | L3MBTL1 (0.67) | CA1CA2CA7CA9CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104073157-B | Diffusing agent composition, the forming method of impurity diffusion layer and solar cell | 东京应化工业株式会社 | 2018-01-02 | — | — | CN | disclosed |
| CN-103579412-B | The method of diffusion of impurity diffusion component and the manufacture method of solar cell | 东京应化工业株式会社 | 2017-06-23 | — | — | CN | disclosed |
| CN-103374296-B | Film formation composition and manufacture method, diffusing agent composition and manufacture method thereof | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-02-24 | — | — | CN | disclosed |
| CN-104334680-B | The manufacture method of phosphor dispersion liquid and the manufacture method of LED matrix | KONICA MINOLTA,INC. (JP) | 2016-01-27 | — | — | CN | disclosed |
| CN-102986004-B | Diffusing agent composition and method for forming impurity diffusion layer | TOKYO OHKA KOGYO CO.,LTD. (JP) | 2016-01-06 | — | — | CN | disclosed |
| CN-102859658-B | The formation method of diffusing agent composition, impurity diffusion layer and solar cell | TOKYO OHKA KOGYO CO.,LTD. (JP) | 2015-09-09 | — | — | CN | disclosed |
| CN-104334680-A | Method for producing phosphor dispersion liquid and method for manufacturing led device | KONICA MINOLTA INC | 2015-02-04 | — | — | CN | disclosed |
| CN-104073157-A | Diffusant composition, method for forming impurity diffusion layer, and solar cell | TOKYO OHKA KOGYO CO LTD | 2014-10-01 | — | — | CN | disclosed |
| CN-102169995-B | Negative electrode base member | TOKYO OHKA KOGYO CO LTD | 2014-09-24 | — | — | CN | disclosed |
| CN-103688340-A | Diffusing agent composition, method for forming impurity diffusion layer, and solar cell | TOKYO OHKA KOGYO CO LTD | 2014-03-26 | — | — | CN | disclosed |
| WO-2008104874-A1 | PROCESS FOR MAKING SILOXANE POLYMERS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-09-04 | — | — | WO | disclosed |
| WO-2008102259-A2 | ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-08-28 | — | — | WO | disclosed |
| US-20080199789-A1 | Antireflective Coating Composition Based on Silicon Polymer | MERCK PATENT GMBH (DE) | 2008-08-21 | — | — | US | disclosed |
| US-20070298349-A1 | Antireflective Coating Compositions Comprising Siloxane Polymer | AZ ELECTRONIC MATERIALS USA CORP. | 2007-12-27 | — | — | US | disclosed |
| WO-2007148223-A2 | ANTIREFLECTIVE COATING COMPOSITIONS COMPRISING SILOXANE POLYMER | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-12-27 | — | — | WO | disclosed |
| EP-1641908-A1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-04-05 | — | — | EP | disclosed |
| WO-2004113486-A1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-29 | — | — | WO | disclosed |
| US-20040259761-A1 | Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION | 2004-12-23 | — | — | US | disclosed |
| US-6515073-B2 | Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |