Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.31 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.31 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28449693 | 0.83 | DNM1 (0.31) | ADRB2ADRB1ADRB3 | |
| SCHEMBL3297260 | 0.83 | HPGD (0.31) | ADRB2ADRB1ADRB3 | |
| SCHEMBL3378895 | 0.74 | — | — | |
| SCHEMBL3297412 | 0.74 | THRB (0.32) | THRB | |
| SCHEMBL705064 | 0.74 | ADRB2 (0.45) | THRBADRB2ADRB1ADRB3 | |
| SCHEMBL28994591 | 0.73 | SMPD1 (0.32) | ADRB2ADRB1ADRB3 | |
| SCHEMBL4305492 | 0.72 | — | — | |
| Hydrochloric Acid SCHEMBL10569892 | 0.71 | ADRB2 (0.43) | THRBADRB2ADRB1ADRB3 | |
| Bromide SCHEMBL9709838 | 0.71 | ADRB2 (0.43) | THRBADRB2ADRB1ADRB3 | |
| Butane SCHEMBL16827219 | 0.71 | ADRB2 (0.43) | THRBADRB2ADRB1ADRB3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110249004-B | Polyimide precursor composition | 东京应化工业株式会社 | 2022-07-19 | — | — | CN | disclosed |
| US-7736837-B2 | Antireflective coating composition based on silicon polymer | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-06-15 | — | — | US | disclosed |
| US-20100093969-A1 | Process for making siloxane polymers | ZHANG RUZHI | 2010-04-15 | — | — | US | disclosed |
| EP-2132253-A1 | PROCESS FOR MAKING SILOXANE POLYMERS | AZ Electronic Materials USA Corp. (US) | 2009-12-16 | — | — | EP | disclosed |
| EP-2129733-A2 | ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER | AZ Electronic Materials USA Corp. (US) | 2009-12-09 | — | — | EP | disclosed |
| US-20090274974-A1 | SPIN-ON GRADED K SILICON ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA CORP. | 2009-11-05 | — | — | US | disclosed |
| WO-2009133456-A1 | SPIN-ON GRADED K SILICON ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-11-05 | — | — | WO | disclosed |
| EP-2035518-A2 | ANTIREFLECTIVE COATING COMPOSITIONS COMPRISING SILOXANE POLYMER | AZ Electronic Materials USA Corp. (US) | 2009-03-18 | — | — | EP | disclosed |
| US-7442675-B2 | Cleaning composition and method of cleaning semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-10-28 | — | — | US | disclosed |
| WO-2008104874-A1 | PROCESS FOR MAKING SILOXANE POLYMERS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-09-04 | — | — | WO | disclosed |
| WO-2008102259-A2 | ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-08-28 | — | — | WO | disclosed |
| US-20080199789-A1 | Antireflective Coating Composition Based on Silicon Polymer | MERCK PATENT GMBH (DE) | 2008-08-21 | — | — | US | disclosed |
| US-20070298349-A1 | Antireflective Coating Compositions Comprising Siloxane Polymer | AZ ELECTRONIC MATERIALS USA CORP. | 2007-12-27 | — | — | US | disclosed |
| WO-2007148223-A2 | ANTIREFLECTIVE COATING COMPOSITIONS COMPRISING SILOXANE POLYMER | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-12-27 | — | — | WO | disclosed |
| US-20040259761-A1 | Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION | 2004-12-23 | — | — | US | disclosed |
| US-6515073-B2 | Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |