Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 known ✓ | P08172 | 2/20 | 0.59 |
| ▸ | CHRM1 known ✓ | P11229 | 2/20 | 0.59 |
| ▸ | ACHE known ✓ | P22303 | 2/20 | 0.59 |
| ▸ | SLC6A2 known ✓ | P23975 | 2/20 | 0.59 |
| ▸ | SLC6A3 known ✓ | Q01959 | 2/20 | 0.59 |
| ▸ | CHRM3 known ✓ | P20309 | 1/20 | 0.57 |
| ▸ | HTT | P42858 | 3/20 | 0.96 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.69 |
| ▸ | MEN1 | O00255 | 2/20 | 0.69 |
| ▸ | MAPT | P10636 | 2/20 | 0.69 |
| ▸ | TP53 | P04637 | 1/20 | 0.69 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.69 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.69 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.69 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.69 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.67 |
| ▸ | LMNA | P02545 | 2/20 | 0.67 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.67 |
| ▸ | NPC1 | O15118 | 1/20 | 0.67 |
| ▸ | RAB9A | P51151 | 1/20 | 0.67 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL10385791 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Hydrochloric Acid SCHEMBL330599 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Hydrochloric Acid SCHEMBL30212612 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Hydrochloric Acid SCHEMBL1502731 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Miripirium SCHEMBL58027 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Hydrochloric Acid SCHEMBL29252089 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Hydrochloric Acid SCHEMBL1502821 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Hydrochloric Acid SCHEMBL9736042 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Water SCHEMBL15361380 | 0.98 | HTT (0.92) | HTTKMT2AMEN1MAPTTP53 | |
| SCHEMBL5305098 | 0.98 | HTT (1.00) | HTTKMT2AMEN1MAPTTP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2615631-B1 | METHOD FOR PRODUCING MICROSTRUCTURE USING PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF MICROSTRUCTURE | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-05-08 | — | — | EP | claimed |
| EP-2615631-A1 | PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF MICROSTRUCTURE, AND METHOD FOR PRODUCING MICROSTRUCTURE USING SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2013-07-17 | — | — | EP | claimed |
| US-20130171828-A1 | PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF MICROSTRUCTURE, AND METHOD FOR PRODUCING MICROSTRUCTURE USING SAME | MITSUBISHI GAS CHEMICAL COMPANY , INC. (JP) | 2013-07-04 | — | — | US | claimed |
| US-12577432-B2 | Organosilicon compound, production method therefor, and curable composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-17 | — | — | US | disclosed |
| EP-4282653-B1 | ORGANOSILICON COMPOUND, PRODUCTION METHOD THEREFOR, AND CURABLE COMPOSITION | SHINETSU CHEMICAL CO (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-20260050220-A1 | COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-19 | — | — | US | disclosed |
| EP-4625046-A2 | COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, MONOMER, AND POLYMER | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-10-01 | — | — | EP | disclosed |
| US-20250297127-A1 | COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, MONOMER, AND POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-25 | — | — | US | disclosed |
| EP-4610730-A2 | COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-03 | — | — | EP | disclosed |
| US-20250271763-A1 | Composition for Forming Organic Film, Method for Forming Organic Film and Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-08-28 | — | — | US | disclosed |
| EP-3842469-B1 | MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHINETSU CHEMICAL CO (JP) | 2025-08-27 | — | — | EP | disclosed |
| EP-0637595-A1 | PROCESS FOR PRODUCING POLYMER | NIPPON SHOKUBAI CO., LTD. (JP) | 1995-02-08 | — | — | EP | disclosed |
| EP-0468404-B1 | Process for preparing di-tert.-butyl dicarbonate | SUMITOMO CHEMICAL CO (JP) | 1994-11-30 | — | — | EP | disclosed |
| EP-0610515-A1 | PROCESS FOR PRODUCING POLYMER | NIPPON SHOKUBAI CO., LTD. (JP) | 1994-08-17 | — | — | EP | disclosed |
| US-5314958-A | Reducing agent, phase transfer catalyst | MITSUBISHI PETROCHEMICAL COMPANY LIMITED (JP) | 1994-05-24 | — | — | US | disclosed |
| EP-0516077-A1 | Process for preparing graft copolymers | MITSUBISHI CHEMICAL CORPORATION (JP) | 1992-12-02 | — | — | EP | disclosed |
| US-5151542-A | Reacting an alkali metal tert-butyl carbonate with methanesulfonyl chloride | SUMITOMO CHEMICAL CO., LTD. (JP) | 1992-09-29 | — | — | US | disclosed |
| EP-0468404-A2 | Process for preparing di-tert.-butyl dicarbonate | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-01-29 | — | — | EP | disclosed |
| US-4613515-A | Fingerprint development kit and process | APPLE ADHESIVES, INC. (US) | 1986-09-23 | — | — | US | disclosed |
| US-4596997-A | Phenolic compound, preparation thereof and recording material employing same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1986-06-24 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12577432-B2 | Organosilicon compound, production method therefor, and curable composition | ASH2L, DOT1L, DNMT3L | CHRM2 976/4885CHRM1 353/4885ACHE 1339/4885 |
| US-20260050220-A1 | COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER | DNMT3B, DNMT3L, RAD51 | CHRM2 218/4885CHRM1 74/4885ACHE 3741/4885 |
| US-20250297127-A1 | COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, MONOMER, AND POLYMER | SLIRP, RER1, ECPAS | CHRM2 3941/4885CHRM1 3632/4885ACHE 2477/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.