Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 known ✓ | P08172 | 2/20 | 0.59 |
| ▸ | CHRM1 known ✓ | P11229 | 2/20 | 0.59 |
| ▸ | ACHE known ✓ | P22303 | 2/20 | 0.59 |
| ▸ | SLC6A2 known ✓ | P23975 | 2/20 | 0.59 |
| ▸ | SLC6A3 known ✓ | Q01959 | 2/20 | 0.59 |
| ▸ | CHRM3 known ✓ | P20309 | 1/20 | 0.57 |
| ▸ | HTT | P42858 | 3/20 | 0.96 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.69 |
| ▸ | MEN1 | O00255 | 2/20 | 0.69 |
| ▸ | MAPT | P10636 | 2/20 | 0.69 |
| ▸ | TP53 | P04637 | 1/20 | 0.69 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.69 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.69 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.69 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.69 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.67 |
| ▸ | LMNA | P02545 | 2/20 | 0.67 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.67 |
| ▸ | NPC1 | O15118 | 1/20 | 0.67 |
| ▸ | RAB9A | P51151 | 1/20 | 0.67 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL10385791 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Hydrochloric Acid SCHEMBL30212612 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Hydrochloric Acid SCHEMBL1502731 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Miripirium SCHEMBL58027 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Hydrochloric Acid SCHEMBL330017 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Hydrochloric Acid SCHEMBL29252089 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Hydrochloric Acid SCHEMBL1502821 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Hydrochloric Acid SCHEMBL9736042 | 1.00 | HTT (0.96) | HTTKMT2AMEN1MAPTTP53 | |
| Water SCHEMBL15361380 | 0.98 | HTT (0.92) | HTTKMT2AMEN1MAPTTP53 | |
| SCHEMBL5305098 | 0.98 | HTT (1.00) | HTTKMT2AMEN1MAPTTP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11549134-B2 | Modified amadoriase and method for producing the same, agent for improving surfactant resistance of amadoriase and composition for measuring HbA1c using the same | KIKKOMAN CORPORATION (JP) | 2023-01-10 | — | — | US | claimed |
| US-20200263228-A1 | MODIFIED AMADORIASE AND METHOD FOR PRODUCING THE SAME, AGENT FOR IMPROVING SURFACTANT RESISTANCE OF AMADORIASE AND COMPOSITION FOR MEASURING HbA1c USING THE SAME | KIKKOMAN CORPORATION (JP) | 2020-08-20 | — | — | US | claimed |
| EP-2615632-B1 | MICROSTRUCTURE MANUFACTURING METHOD USING TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-05-08 | — | — | EP | claimed |
| EP-2615631-B1 | METHOD FOR PRODUCING MICROSTRUCTURE USING PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF MICROSTRUCTURE | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-05-08 | — | — | EP | claimed |
| US-20160186232-A1 | MODIFIED AMADORIASE AND METHOD FOR PRODUCING THE SAME, AGENT FOR IMPROVING SURFACTANT RESISTANCE OF AMADORIASE AND COMPOSITION FOR MEASURING HbA1c USING THE SAME | KIKKOMAN CORPORATION (JP) | 2016-06-30 | — | — | US | claimed |
| EP-3031914-A1 | MODIFIED AMADORIASE AND METHOD FOR PRODUCING SAME, AGENT FOR IMPROVING SURFACTANT-RESISTANCE OF AMADORIASE AND COMPOSITION FOR MEASURING HbA1c USING SAME | Kikkoman Corporation (JP) | 2016-06-15 | — | — | EP | claimed |
| US-8980812-B2 | Treatment liquid for inhibiting pattern collapse in microstructures, and microstructure manufacturing method using said treatment liquid | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-03-17 | — | — | US | claimed |
| EP-2615632-A1 | TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID | Mitsubishi Gas Chemical Company, Inc. (JP) | 2013-07-17 | — | — | EP | claimed |
| EP-2615631-A1 | PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF MICROSTRUCTURE, AND METHOD FOR PRODUCING MICROSTRUCTURE USING SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2013-07-17 | — | — | EP | claimed |
| US-20130171828-A1 | PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF MICROSTRUCTURE, AND METHOD FOR PRODUCING MICROSTRUCTURE USING SAME | MITSUBISHI GAS CHEMICAL COMPANY , INC. (JP) | 2013-07-04 | — | — | US | claimed |
| US-20130165365-A1 | TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-06-27 | — | — | US | claimed |
| US-20260045593-A1 | THERMAL INSULATING MATERIAL | NITTO DENKO CORPORATION (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20260022412-A1 | METHOD AND KIT FOR DETECTING MICROORGANISM OR CELL, DETECTING MICROORGANISM RELATED SUBSTANCE OR CELL RELATED SUBSTANCE | KIKKOMAN CORPORATION (JP) | 2026-01-22 | — | — | US | disclosed |
| EP-4560025-A1 | METHOD AND KIT FOR DETECTING MICROORGANISM OR CELL, OR DETECTING MICROORGANISM RELATED SUBSTANCE OR CELL RELATED SUBSTANCE | Kikkoman Corporation (JP) | 2025-05-28 | — | — | EP | disclosed |
| WO-2025070432-A1 | HEAT INSULATING MATERIAL | 日東電工株式会社 | 2025-04-03 | — | — | WO | disclosed |
| EP-0262343-A2 | N-alkylated quaternary nitrogen-containing heterocycles, process for their preparation and their use in pharmaceutical compositions | MEDICEChem.-Pharm. Fabrik Pütter GmbH & Co. KG (DE) | 1988-04-06 | — | — | EP | disclosed |
| EP-0260428-A2 | Cationic surfactants and pharmaceutical compositions containing them | MEDICEChem.-Pharm. Fabrik Pütter GmbH & Co. KG (DE) | 1988-03-23 | — | — | EP | disclosed |
| EP-0260429-A2 | N-alkylated quaternary nitrogen-containing heterocycles, process for their preparation and their use in pharmaceutical compositions | MEDICEChem.-Pharm. Fabrik Pütter GmbH & Co. KG (DE) | 1988-03-23 | — | — | EP | disclosed |
| EP-0258672-A2 | Cationic surfactants and pharmaceutical compositions containing them | MEDICEChem.-Pharm. Fabrik Pütter GmbH & Co. KG (DE) | 1988-03-09 | — | — | EP | disclosed |
| EP-0257400-A2 | Pharmaceutical compositions containing cationic surfactants | MEDICEChem.-Pharm. Fabrik Pütter GmbH & Co. KG (DE) | 1988-03-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260022412-A1 | METHOD AND KIT FOR DETECTING MICROORGANISM OR CELL, DETECTING MICROORGANISM RELATED SUBSTANCE OR CELL RELATED SUBSTANCE | P2RY6, TK1, P2RX6 | CHRM2 821/4885CHRM1 815/4885ACHE 28/4885 |
| US-20260045593-A1 | THERMAL INSULATING MATERIAL | ARID2, BET1, H1-4 | CHRM2 180/4885CHRM1 189/4885ACHE 4026/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.