Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.52 |
| ▸ | ACHE | P22303 | 1/20 | 0.46 |
| ▸ | PDE4A | P27815 | 4/20 | 0.45 |
| ▸ | PDE4B | Q07343 | 4/20 | 0.45 |
| ▸ | PDE4C | Q08493 | 4/20 | 0.45 |
| ▸ | PDE4D | Q08499 | 4/20 | 0.45 |
| ▸ | FNTA | P49354 | 1/20 | 0.41 |
| ▸ | FNTB | P49356 | 1/20 | 0.41 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.36 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.36 |
| ▸ | PDE5A | O76074 | 3/20 | 0.36 |
| ▸ | PDE1A | P54750 | 3/20 | 0.36 |
| ▸ | PDE1B | Q01064 | 3/20 | 0.36 |
| ▸ | PDE3B | Q13370 | 3/20 | 0.36 |
| ▸ | PDE1C | Q14123 | 3/20 | 0.36 |
| ▸ | PDE3A | Q14432 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10882757 | 0.94 | MAPT (0.47) | MAPTACHEPDE4APDE4BPDE4C | |
| SCHEMBL16240772 | 0.92 | MAPT (0.46) | MAPTACHEPDE4APDE4BPDE4C | |
| SCHEMBL4111195 | 0.90 | MAPT (0.44) | MAPTACHEPDE4APDE4BPDE4C | |
| SCHEMBL13178977 | 0.90 | MAPT (0.44) | MAPTACHEPDE4APDE4BPDE4C | |
| SCHEMBL20362610 | 0.89 | MAPT (0.47) | MAPTACHEPDE4APDE4BPDE4C | |
| SCHEMBL10064029 | 0.87 | ACHE (0.61) | MAPTACHEPDE4APDE4BPDE4C | |
| SCHEMBL10104522 | 0.81 | MAPT (0.41) | MAPTACHEPDE4APDE4BPDE4C | |
| SCHEMBL20109779 | 0.81 | ACHE (0.53) | MAPTACHEPDE4APDE4BPDE4C | |
| SCHEMBL27695787 | 0.81 | MAPT (0.74) | MAPTACHEPDE4APDE4BPDE4C | |
| SCHEMBL3692216 | 0.81 | MAPT (0.52) | MAPTPDE4APDE4BPDE4CPDE4D |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0212482-B1 | PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1989-04-19 | — | — | EP | claimed |
| EP-0212482-A2 | Process for obtaining negative images from positive photoresists | HOECHST CELANESE CORPORATION (US) | 1987-03-04 | — | — | EP | claimed |
| US-4438189-A | POLYUNSATURATED COMPOUND, CROSSLINKABLE EPOXY OR METHYLOL COMPOUND | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-03-20 | — | — | US | claimed |
| US-12572075-B2 | Composition, method of forming resist underlayer film, and method of forming resist pattern | JSR CORPORATION (JP) | 2026-03-10 | — | — | US | disclosed |
| US-12265333-B2 | Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compound | JSR CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| US-12043833-B2 | Targeted compositions | ARBUTUS BIOPHARMA CORPORATION (CA) | 2024-07-23 | — | — | US | disclosed |
| US-20240231231-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240030030-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | JSR CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240021429-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | JSR CORPORATION (JP) | 2024-01-18 | — | — | US | disclosed |
| EP-4270448-A1 | FILM FORMATION METHOD AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2023-11-01 | — | — | EP | disclosed |
| US-20230343591-A1 | FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2023-10-26 | — | — | US | disclosed |
| EP-0369219-A1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-05-23 | — | — | EP | disclosed |
| EP-0167963-B1 | LIGHT-SENSITIVE COMPOSITION AND LIGHT SENSITIVE REGISTRATION MATERIAL PREPARED THEREWITH | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-04-04 | — | — | EP | disclosed |
| EP-0212482-B1 | PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1989-04-19 | — | — | EP | disclosed |
| EP-0298393-A2 | Process for producing negative images from positive photoresists containing curcumin and a light-sensitive material containing curcumin | HOECHST CELANESE CORPORATION (US) | 1989-01-11 | — | — | EP | disclosed |
| US-4659645-A | PRINTING PLATES; PHOTORESISTS | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-04-21 | — | — | US | disclosed |
| EP-0212482-A2 | Process for obtaining negative images from positive photoresists | HOECHST CELANESE CORPORATION (US) | 1987-03-04 | — | — | EP | disclosed |
| EP-0073444-B1 | RADIATION-POLYMERISABLE COMPOSITION AND COPYING MATERIAL MADE THEREFROM | HOECHST AKTIENGESELLSCHAFT (DE) | 1986-03-05 | — | — | EP | disclosed |
| EP-0167963-A2 | Light-sensitive composition and light sensitive registration material prepared therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1986-01-15 | — | — | EP | disclosed |
| US-4438189-A | POLYUNSATURATED COMPOUND, CROSSLINKABLE EPOXY OR METHYLOL COMPOUND | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-03-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12572075-B2 | Composition, method of forming resist underlayer film, and method of forming resist pattern | TOP1, NAF1, ASH2L | MAPT 3865/4885ACHE 3866/4885PDE4A 4857/4885 |
| US-12265333-B2 | Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compound | TOP1, RER1, ABCC1 | MAPT 2984/4885ACHE 1882/4885PDE4A 4856/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.