Known targets — ChEMBL curated mechanism
CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.53 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.53 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.53 |
| ▸ | THPO | P40225 | 1/20 | 0.53 |
| ▸ | BCHE | P06276 | 1/20 | 0.50 |
| ▸ | ACHE | P22303 | 1/20 | 0.50 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.46 |
| ▸ | CA12 | O43570 | 2/20 | 0.46 |
| ▸ | CA9 | Q16790 | 2/20 | 0.46 |
| ▸ | ATM | Q13315 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.44 |
| ▸ | CNR2 | P34972 | 6/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10860949 | 0.97 | LMNA (0.53) | LMNACYP2D6CYP3A4MAPK1THPO | |
| SCHEMBL330932 | 0.92 | LMNA (0.43) | LMNACYP2D6CYP3A4MAPK1THPO | |
| SCHEMBL11723030 | 0.92 | CYP3A4 (0.50) | LMNACYP2D6CYP3A4MAPK1THPO | |
| SCHEMBL28368039 | 0.88 | LMNA (0.48) | LMNACYP2D6CYP3A4MAPK1THPO | |
| SCHEMBL11241529 | 0.88 | HTT (0.64) | LMNACYP2D6CYP3A4MAPK1THPO | |
| SCHEMBL11574807 | 0.86 | LMNA (0.67) | LMNACYP2D6CYP3A4MAPK1THPO | |
| SCHEMBL2149541 | 0.86 | BCHE (0.49) | LMNACYP2D6CYP3A4MAPK1THPO | |
| SCHEMBL331085 | 0.85 | HTT (0.52) | LMNACYP2D6CYP3A4MAPK1THPO | |
| SCHEMBL331272 | 0.85 | ALDH1A1 (0.57) | LMNACYP2D6CYP3A4MAPK1THPO | |
| Sulfuric Acid SCHEMBL2909993 | 0.85 | CYP1A2 (0.46) | LMNACYP2D6MAPK1BCHEACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080196626-A1 | High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry | MERCK PATENT GMBH (DE) | 2008-08-21 | — | — | US | claimed |
| CN-112947000-B | Composition for forming silicon-containing EUV resist underlayer film containing sulfonate | 日产化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| US-10613440-B2 | Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-04-07 | — | — | US | disclosed |
| EP-2295484-B1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM SAME POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL | MITSUI CHEMICALS INC (JP) | 2018-01-17 | — | — | EP | disclosed |
| EP-2407498-B1 | Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material | MITSUI CHEMICALS INC (JP) | 2017-11-15 | — | — | EP | disclosed |
| US-20150210829-A1 | SILICON-CONTAINING EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ONIUM SULFONATE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-07-30 | — | — | US | disclosed |
| EP-2881794-A1 | COMPOSITION FOR FORMING UNDERLAYER FILM FOR SILICON-CONTAINING EUV RESIST AND CONTAINING ONIUM SULFONATE | Nissan Chemical Industries, Ltd. (JP) | 2015-06-10 | — | — | EP | disclosed |
| US-8304507-B2 | Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material | MITSUI CHEMICALS, INC. (JP) | 2012-11-06 | — | — | US | disclosed |
| EP-2450412-A1 | Silicone coating composition | AZ Electronic Materials USA Corp. (US) | 2012-05-09 | — | — | EP | disclosed |
| EP-2407498-A2 | Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material | Mitsui Chemicals, Inc. (JP) | 2012-01-18 | — | — | EP | disclosed |
| US-8026040-B2 | High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-09-27 | — | — | US | disclosed |
| US-20110112269-A1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM THE POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL | MITSUI CHEMICALS, INC. (JP) | 2011-05-12 | — | — | US | disclosed |
| EP-2295484-A1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM SAME POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL | Mitsui Chemicals, Inc. (JP) | 2011-03-16 | — | — | EP | disclosed |
| US-6727294-B2 | RADIATION TRANSPARENT MOLDING MATERIALS | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20010034419-A1 | Radiation transparent molding materials | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2001-10-25 | — | — | US | disclosed |
| US-3966720-A | Process for producing desacetoxy cephalosporanic acid compound | NIKKEN CHEMICALS CO., LTD. (JA) | 1976-06-29 | — | — | US | disclosed |