SCHEMBL331272

SCHEMBL331272

C[N+](C)(C)Cc1ccccc1.Cc1ccc(S(=O)(=O)[O-])cc1

nearest known ligand 0.57

Known targets — ChEMBL curated mechanism

CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.57
KDM4E B2RXH2 1/20 0.57
TDP1 Q9NUW8 1/20 0.57
CYP3A4 P08684 2/20 0.54
LMNA P02545 2/20 0.54
CYP2D6 P10635 1/20 0.54
MAPK1 P28482 1/20 0.54
THPO P40225 1/20 0.54
CA12 O43570 2/20 0.50
CA9 Q16790 2/20 0.50
BCHE P06276 1/20 0.50
ACHE P22303 1/20 0.50
CYP1A2 P05177 1/20 0.50
ATM Q13315 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
MCHR1 Q99705 1/20 0.47
CNR2 P34972 4/20 0.44
KMT2A Q03164 2/20 0.43
MEN1 O00255 1/20 0.42
MAPT P10636 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL331215 0.91 KDM4E (0.63) ALDH1A1KDM4ETDP1CYP3A4LMNA
SCHEMBL11723030 0.90 CYP3A4 (0.50) ALDH1A1KDM4ETDP1CYP3A4LMNA
SCHEMBL1130503 0.87 CYP3A4 (0.49) ALDH1A1KDM4ETDP1CYP3A4LMNA
SCHEMBL11574807 0.87 LMNA (0.67) ALDH1A1KDM4ETDP1CYP3A4LMNA
SCHEMBL330892 0.85 LMNA (0.53) ALDH1A1CYP3A4LMNACYP2D6MAPK1
SCHEMBL10860949 0.85 LMNA (0.53) ALDH1A1CYP3A4LMNACYP2D6MAPK1
Sulfuric Acid SCHEMBL229799 0.85 KDM4E (0.71) ALDH1A1KDM4ETDP1CYP3A4MAPK1
SCHEMBL594198 0.85 ALDH1A1 (0.55) ALDH1A1KDM4ETDP1CYP3A4LMNA
SCHEMBL332134 0.83 KDM4E (0.68) ALDH1A1KDM4ETDP1CYP3A4CA12
Sulfuric Acid SCHEMBL7637635 0.83 KDM4E (0.68) ALDH1A1KDM4ETDP1CYP3A4MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 176 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3212682-B1 VULCANISABLE COMPOSITIONS COMPRISING ETHYLENE-VINYLACETATE-COPOLYMERS CONTAINING EPOXY GROUPS ARLANXEO DEUTSCHLAND GMBH (DE) 2019-01-09 EP claimed
US-20170335037-A1 VULCANIZABLE COMPOSITIONS CONTAINING EPOXY GROUP-CONTAINING ETHYLENE-VINYL ACETATE COPOLYMERS ARLANXEO DEUTSCHLAND GMBH (DE) 2017-11-23 US claimed
EP-3212682-A1 VULCANIZABLE COMPOSITIONS CONTAINING EPOXY GROUP-CONTAINING ETHYLENE-VINYL ACETATE COPOLYMERS ARLANXEO Deutschland GmbH (DE) 2017-09-06 EP claimed
WO-2016066426-A1 VULCANIZABLE COMPOSITIONS CONTAINING EPOXY GROUP-CONTAINING ETHYLENE-VINYL ACETATE COPOLYMERS LANXESS DEUTSCHLAND GMBH (DE) 2016-05-06 WO claimed
EP-3015483-A1 Ethylene-vinylacetate-copolymers containing epoxy groups LANXESS Deutschland GmbH (DE) 2016-05-04 EP claimed
EP-0749450-B1 COATING COMPOSITION AND PROCESS FOR FORMING CURED FILM NIPPON PAINT CO LTD (JP) 2000-07-05 EP claimed
US-4931509-A EPOXY-CONTAINING MONOMER; EXCELLENT VULCANIZING WITH UREAS, QUATERNARY AMMONIUM AND PHOSPHONIUM SALTS AND POLYCARBOXYLIC ACIDS OR ANHYDRIDES NIPPON ZEON CO., LTD. (JP) 1990-06-05 US claimed
EP-4688387-A1 3D-PRINTABLE COMPOSITIONS COMPRISING POLYLACTIC ACID AND A CROSSLINKED FUNCTIONAL ETHYLENE-VINYL ACETATE COPOLYMER ARLANXEO Deutschland GmbH (DE) 2026-02-11 EP disclosed
WO-2024260582-A1 3D-PRINTABLE COMPOSITIONS COMPRISING POLYLACTIC ACID AND A CROSSLINKED FUNCTIONAL ETHYLENE-VINYL ACETATE COPOLYMER ARLANXEO DEUTSCHLAND GMBH (DE) 2024-12-26 WO disclosed
WO-2023286767-A1 THERMOCONDUCTIVE MATERIAL COMPOSITION 株式会社大阪ソーダ 2023-01-19 WO disclosed
US-11450445-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2022-09-20 US disclosed
US-20200303086-A1 ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-09-24 US disclosed
US-10720259-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-07-21 US disclosed
US-5200472-A Alkyl acrylate, alkoxyalkyl acrylate, epoxy-containing vinyl monomer, unsaturated aryl ester; diphenyl phthalate, quaternary ammonium, phosphonium, urea or guanidine crosslinkers NIPPON MEKTRON, LIMITED (JP) 1993-04-06 US disclosed
US-5145618-A Passing sandwich of support substrate and pliable foil with polymerizable liquid between rolls, separating solid polymer sheet IONICS, INCORPORATED (US) 1992-09-08 US disclosed
US-5082903-A Quaternary ammonium or phosphonium salt NIPPON MIKTRON LIMITED (JP) 1992-01-21 US disclosed
US-5039756-A Vulcanization Systems SUMITOMO CHEMICAL CO., LTD. (JP) 1991-08-13 US disclosed
US-4931509-A EPOXY-CONTAINING MONOMER; EXCELLENT VULCANIZING WITH UREAS, QUATERNARY AMMONIUM AND PHOSPHONIUM SALTS AND POLYCARBOXYLIC ACIDS OR ANHYDRIDES NIPPON ZEON CO., LTD. (JP) 1990-06-05 US disclosed
EP-0257640-A2 Vulcanizable elastomer composition NIPPON ZEON CO., LTD. (JP) 1988-03-02 EP disclosed
US-4650834-A POLYCARBOXYLIC ACID, QUATERNARY AMMONIUM OR PHOSPHONIUM SALT NIPPON ZEON CO., LTD. (JP) 1987-03-17 US disclosed