Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.56 |
| ▸ | MEN1 | O00255 | 2/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21469076 | 0.97 | MEN1 (0.58) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| SCHEMBL648428 | 0.85 | — | — | |
| SCHEMBL14252472 | 0.82 | MEN1 (0.52) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| SCHEMBL13096775 | 0.82 | GAA (0.38) | TSHRMAPK1MEN1KMT2ATHRB | |
| SCHEMBL15910182 | 0.82 | MEN1 (0.32) | MEN1KMT2A | |
| SCHEMBL13303159 | 0.80 | GAA (0.41) | TSHRMAPK1MEN1KMT2ATHRB | |
| SCHEMBL3338023 | 0.80 | GAA (0.41) | TSHRMAPK1MEN1KMT2ATHRB | |
| SCHEMBL25372237 | 0.80 | MEN1 (0.50) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| SCHEMBL23014813 | 0.80 | MEN1 (0.50) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| SCHEMBL1148278 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103384719-B | Bearing grease | IDEMITSU KOSAN CO.,LTD. (JP) | 2015-11-25 | — | — | CN | claimed |
| EP-3398983-B1 | POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS | SHINETSU CHEMICAL CO (JP) | 2023-09-27 | — | — | EP | disclosed |
| US-11768434-B2 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-26 | — | — | US | disclosed |
| US-11150556-B2 | Polymer of polyimide precursor, positive type photosensitive resin composition, negative type photosensitive resin composition, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-10-19 | — | — | US | disclosed |
| US-20200326624-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD OF FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-15 | — | — | US | disclosed |
| US-20200041903-A1 | POLYMER HAVING A STRUCTURE OF POLYAMIDE, POLYAMIDE-IMIDE, OR POLYIMIDE, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, PHOTOSENSITIVE DRY FILM, AND PROTECTIVE FILM FOR ELECTRIC AND ELECTRONIC PARTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-02-06 | — | — | US | disclosed |
| EP-3275857-B1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | SHINETSU CHEMICAL CO (JP) | 2019-06-05 | — | — | EP | disclosed |
| EP-3275857-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | Shin-Etsu Chemical Co., Ltd. (JP) | 2018-01-31 | — | — | EP | disclosed |
| US-20180024434-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-20180024434-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-7572799-B2 | Pyrazolo[4,3-d]pyrimidines as Phosphodiesterase Inhibitors | PFIZER INC (US) | 2009-08-11 | — | — | US | disclosed |
| CN-101362765-A | 5,7-diaminopyrazolo '4,3-d!pyrimidines with PDE-5 inhibiting activity | PFIZER (US) | 2009-02-11 | — | — | CN | disclosed |
| CN-101362764-A | 5,7-diaminopyrazolo '4,3-d!pyrimidines with PDE-5 inhibiting activity | PFIZER (US) | 2009-02-11 | — | — | CN | disclosed |
| US-20070203181-A1 | Quinoline Derivatives And Insecticide Comprising Thereof As Active Ingredient | MEIJI SEIKA KAISHA, LTD. (JP) | 2007-08-30 | — | — | US | disclosed |
| EP-1780202-A1 | QUINOLINE DERIVATIVE AND INSECTICIDE CONTAINING SAME AS ACTIVE CONSTITUENT | MEIJI SEIKA KAISHA LTD. (JP) | 2007-05-02 | — | — | EP | disclosed |
| CN-1882591-A | 5, 7-diaminopyrazolo [4, 3-d ] pyrimidines with PDE-5 inhibiting activity | PFIZER LTD (US) | 2006-12-20 | — | — | CN | disclosed |
| EP-1689751-A1 | 5,7-DIAMINOPYRAZOLO¬4,3-D|PYRIMIDINES WITH PDE-5 INHIBITING ACTIVITY | Pfizer Limited (GB) | 2006-08-16 | — | — | EP | disclosed |
| US-20050245544-A1 | Novel pharmaceuticals | AMPLIFIED PROTEOMICS INC. | 2005-11-03 | — | — | US | disclosed |
| WO-2005049616-A1 | 5,7-DIAMINOPYRAZOLO [4,3-d] PYRIMIDINES WITH PDE-5 INHIBITING ACTIVITY | PFIZER LIMITED (GB) | 2005-06-02 | — | — | WO | disclosed |
| WO-2005049616-A1 | 5,7-DIAMINOPYRAZOLO [4,3-d] PYRIMIDINES WITH PDE-5 INHIBITING ACTIVITY | PFIZER LIMITED (GB) | 2005-06-02 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070203181-A1 | Quinoline Derivatives And Insecticide Comprising Thereof As Active Ingredient | DDT, ACHE, NQO1 | TSHR 4609/4885MAPK1 3156/4885MEN1 2940/4885 |
| US-20050245544-A1 | Novel pharmaceuticals | ABCB11, PCSK9, SLC10A1 | TSHR 3279/4885MAPK1 3675/4885MEN1 702/4885 |
| US-20180024434-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | F12, RTF1, PUF60 | TSHR 2176/4885MAPK1 1025/4885MEN1 1788/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.