SCHEMBL332012

SCHEMBL332012

CO[Si](OC)(OC)c1ccccc1[Si](OC)(OC)OC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.41
KDM4E B2RXH2 3/20 0.41
SMN1; SMN2 Q16637 3/20 0.41
MAPK1 P28482 1/20 0.41
CA1 P00915 3/20 0.38
CA2 P00918 3/20 0.38
CA4 P22748 2/20 0.38
CA7 P43166 2/20 0.38
CA9 Q16790 2/20 0.38
CA12 O43570 1/20 0.38
CA14 Q9ULX7 1/20 0.38
POLB P06746 3/20 0.37
CYP1A2 P05177 2/20 0.36
CYP2C19 P33261 2/20 0.36
NQO2 P16083 3/20 0.32
TSHR P16473 3/20 0.31
TP53 P04637 2/20 0.31
TDP1 Q9NUW8 2/20 0.31
LMNA P02545 2/20 0.31
MAPT P10636 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30264142 1.00 ALDH1A1 (0.41) ALDH1A1KDM4ESMN1; SMN2MAPK1CA1
Benzene SCHEMBL28228276 0.97 CA4 (0.41) ALDH1A1KDM4ESMN1; SMN2MAPK1CA1
SCHEMBL13027844 0.89 ALDH1A1 (0.35) ALDH1A1KDM4ESMN1; SMN2MAPK1CA1
SCHEMBL30676960 0.89 ALDH1A1 (0.35) ALDH1A1KDM4ESMN1; SMN2MAPK1CA1
SCHEMBL1696539 0.87 ALDH1A1 (0.33) ALDH1A1KDM4ESMN1; SMN2MAPK1CA1
SCHEMBL1109638 0.86 ALDH1A1 (0.37) ALDH1A1KDM4ESMN1; SMN2MAPK1CA1
SCHEMBL106098 0.84 TSHR (0.43) ALDH1A1KDM4ESMN1; SMN2MAPK1CA1
SCHEMBL1038640 0.82 ALDH1A1 (0.33) ALDH1A1KDM4ESMN1; SMN2MAPK1CA1
SCHEMBL1971497 0.82 CA1 (0.55) ALDH1A1KDM4ESMN1; SMN2MAPK1CA1
SCHEMBL6036849 0.82 ACHE (0.39) ALDH1A1KDM4ESMN1; SMN2MAPK1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 454 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250304819-A1 Flexible and foldable abrasion resistant photopatternable siloxane hard coat OPTITUNE OY (FI) 2025-10-02 US claimed
US-11634610-B2 Siloxane polymer compositions and their use OPTITUNE OY (FI) 2023-04-25 US claimed
US-20220010172-A1 SILOXANE POLYMER COMPOSITIONS AND THEIR USE OPTITUNE OY (FI) 2022-01-13 US claimed
US-11127864-B2 Carbosiloxane polymer compositions, methods of producing the same and the use thereof OPTITUNE OY (FI) 2021-09-21 US claimed
US-20210087429-A1 Flexible and foldable abrasion resistant photopatternable siloxane hard coat OPTITUNE OY (FI) 2021-03-25 US claimed
CN-109070050-A The porous surface material of the core comprising coating for chromatographic isolation with narrow particle size distribution, preparation method, with and application thereof 沃特世科技公司 2018-12-21 CN claimed
US-20180277691-A1 Novel carbosiloxane polymer compositions, methods of producing the same and the use thereof OPTITUNE OY (FI) 2018-09-27 US claimed
US-20180066159-A1 SILOXANE POLYMER COMPOSITIONS AND THEIR USE BASF SE (DE) 2018-03-08 US claimed
EP-2598440-A2 SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS HYBRID CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS Waters Technologies Corporation (US) 2013-06-05 EP claimed
WO-2012018596-A2 SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS HYBRID CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS WATERS TECHNOLOGIES CORPORATION (US) 2012-02-09 WO claimed
US-7932295-B2 Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR CORPORATION (JP) 2011-04-26 US claimed
US-7875317-B2 formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors JSR CORPORATION (JP) 2011-01-25 US claimed
CN-101553496-A Novel carbonylation ligands and their use in the carbonylation of ethylenically unsaturated compounds LUCITE INT UK LTD (GB) 2009-10-07 CN claimed
US-20080246153-A1 ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE JSR CORPORATION (JP) 2008-10-09 US claimed
US-7399715-B2 Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR CORPORATION (JP) 2008-07-15 US claimed
US-20250304819-A1 Flexible and foldable abrasion resistant photopatternable siloxane hard coat OPTITUNE OY (FI) 2025-10-02 US disclosed
US-20250257239-A1 POLYSILOXANE COMPOSITIONS FOR OPTOELECTRONIC DEVICE APPLICATIONS INVOLVING MOISTURE SENSITIVE LAYERS SOLSTICE ADVANCED MATERIALS US, INC. 2025-08-14 US disclosed
US-RE34675-E Silane coupler, di-trialkoxysilane crosslinker, solvent DOW CORNING CORPORATION (US) 1994-07-26 US disclosed
EP-0255227-A2 Coupling agent compositions DOW CORNING CORPORATION (US) 1988-02-03 EP disclosed
US-4689085-A A MIXTURE OF A BIS(TRIALKOXYSILANE) AND A MONO (TRIALKOXYSILANE; PRIMERS FOR LAMINATES AND COMPOSITES; ADHESION DOW CORNING CORPORATION (US) 1987-08-25 US disclosed