SCHEMBL3335015

SCHEMBL3335015

C=CC(=O)C(=O)COP(=O)(OCC(=O)C(=O)C=C)OCC(=O)C(=O)C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3143406 0.84 TPI1 (0.43)
SCHEMBL8194485 0.78 TSHR (0.30)
SCHEMBL4914837 0.67 LMNA (0.42)
Acrylic Acid SCHEMBL16340105 0.65 LMNA (0.48)
SCHEMBL13385825 0.64
SCHEMBL2786641 0.64 TSHR (0.43)
SCHEMBL735649 0.64 TSHR (0.37)
Triethyl Phosphate SCHEMBL21436573 0.64 TSHR (0.59)
Triethyl Phosphate SCHEMBL28253023 0.64 TSHR (0.59)
SCHEMBL40904 0.62 TSHR (0.61)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8221958-B2 Photosensitive paste and sintered layer E.I. DU PONT DE NEMOURS AND COMPANY (US) 2012-07-17 US disclosed
US-20100136484-A1 PHOTOSENSITIVE PASTE AND SINTERED LAYER E.I. DU PONT DE NEMOURS AND COMPANY (US) 2010-06-03 US disclosed
WO-2009146400-A1 PHOTOSENSITIVE PASTE AND SINTERED LAYER E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-12-03 WO disclosed